Phosphorus Diffusion from Doped Polysilicon through Ultra-Thin SiO_2 Films into Si Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-10-01
著者
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Matsumoto Satoru
Department of Cardiology, Toyonaka Municipal Hospital
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SATO Yoshiyuki
NTT LSI Laboratories
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SAITO Kazumasa
Department of Electronics and Electrical Engineering, Keio University
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Komatsu Yukio
Department Of Electrical Engineering Keio University
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Saito Kazumasa
Department Of Electrical Engineering Keio University
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TSUBO Yumiko
Department of Electrical Engineering, Keio University
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YAMAMOTO Ikunao
Okayama University, Faculty of Engineering
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YAMASHITA Yoshifumi
Okayama University, Faculty of Engineering
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Tsubo Yumiko
Department Of Electrical Engineering Keio University
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Yamamoto Ikunao
Okayama University Faculty Of Engineering
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Yamashita Yoshifumi
Okayama University Faculty Of Engineering
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Sato Yoshiyuki
Ntt Laboratories
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