Kasu Makoto | Ntt Basic Research Laboratories
スポンサーリンク
概要
関連著者
-
Kasu Makoto
Ntt Basic Research Laboratories
-
Kasu Makoto
Ntt Basic Research Laboratories Ntt Corporation
-
Makimoto Toshiki
Ntt Basic Laboratories Ntt Corporation
-
Taniyasu Yoshitaka
Ntt Basic Research Laboratories Ntt Corporation
-
MAKIMOTO Toshiki
NTT Basic Research Laboratories, NTT Corporation
-
KOBAYASHI Naoki
NTT Basic Research Laboratories
-
Kumakura Kazuhide
Ntt Basic Laboratories Ntt Corporation
-
Kobayashi Naoki
Ntt Basic Laboratories Ntt Corporation
-
Hirama Kazuyuki
Ntt Basic Research Laboratories Ntt Corporation
-
TANIYASU Yoshitaka
NTT Basic Research Laboratories, NTT Corporation
-
KIDO Takatoshi
Shonan Institute of Technology
-
MATSUMOTO Nobuo
Shonan Institute of Technology
-
Kasu M
Ntt Corp. Atsugi Jpn
-
AKASAKA Tetsuya
NTT Basic Research Laboratories, NTT Corporation
-
Kobayashi N
The University Of Electro-communications Department Of Applied Physics And Chemistry
-
Akasaka Tetsuya
Ntt Basic Research Laboratories Ntt Corporation
-
Makimoto T
Ntt Basic Research Laboratories
-
Yamauchi Yoshiharu
Ntt Basic Research Laboratories
-
Ueda Kenji
Ntt Basic Research Laboratories Ntt Corporation
-
Akasaka Tetsuya
NTT Basic Research Laboratories
-
SATO Hisashi
NTT Basic Research Laboratories
-
KUMAKURA Kazuhide
NTT Basic Research Laboratories, NTT Corporation
-
Kasu Makoto
Ntt Corp. Kanagawa Jpn
-
Kubovic Michal
Ntt Basic Research Laboratories
-
KOBAYASHI Yasuyuki
NTT Basic Research Laboratories, NTT Corporation
-
BENCHIMOL Jean
NTT Basic Research Laboratories
-
Kageshima Hiroyuki
Ntt Basic Research Laboratories
-
Benchimol J.l.
Ntt Basic Research Laboratories:france Telecom Cnet Bagneux Laboratories
-
Kobayashi Yasuyuki
Ntt Basic Research Laboratories Ntt Corporation
-
Kumakura Kazuhide
Ntt Basic Research Laboratories Ntt Corporation
-
Kobayashi Yasuyuki
Ntt Basic Research Laboratories
-
Makimoto Toshiki
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Makoto Kasu
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Kasu Makoto
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Kasu Makoto
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Kasu Makoto
NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
-
KAGESHIMA Hiroyuki
NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
-
Kubovic Michal
Department Of Electron Devices And Circuits University Of Ulm
-
ALEKSOV Aleksandar
Department of Electron Devices and Circuits , University of Ulm
-
KOHN Erhard
Department of Electron Devices and Circuits , University of Ulm
-
Fukui T
Ntt Basic Research Laboratories:(present Address) Research Center For Interface Quantum Electronics
-
FUKUI Takashi
NTT Basic Research Laboratories
-
UEDA Kenji
NTT Basic Research Laboratories, NTT Corporation
-
YAMAUCHI Yoshiharu
NTT Basic Research Laboratories, NTT Corporation
-
Maeda Narihiko
Ntt Photonics Laboratories Ntt Corporation
-
YAMAUCHI Yoshiharu
NEL TechnoSupport
-
Kageshima Hiroyuki
Ntt Basic Research Laboratories Ntt Corporation
-
Sauer Rolf
Department Of Semiconductor Physics University Of Ulm
-
Teofilov Nikolai
Department Of Semiconductor Physics University Of Ulm
-
Harada Yuichi
Ntt Basic Research Laboratories
-
Yamamoto Hideki
Ntt Basic Research Laboratories
-
Nishikawa Atsushi
Ntt Basic Research Laboratories Ntt Corporation
-
Shiraishi Kenji
Graduate School Of Applied Physics Univ Of Tsukuba
-
Kobayashi Naoki
Ntt Basic Research Laboratories Ntt Corporation
-
Kamiya Katsumasa
Graduate School Of Pure And Applied Sciences University Of Tsukuba
-
Sasaki Satoshi
Ntt Basic Research Laboratories
-
Sauer Rolf
Department of Semiconductor Physics, University of Ulm, Albert-Einstein Allee 45, D-89069 Ulm, Germany
-
Kohn Erhard
Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein Allee 45, D-89081 Ulm, Germany
-
Teofilov Nikolai
Department of Semiconductor Physics, University of Ulm, Albert-Einstein Allee 45, D-89069 Ulm, Germany
-
Maeda Narihiko
NTT Photonics Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Ye Haitao
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Kenji Ueda
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Ueda Kenji
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Makimoto Toshiki
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi 243-0198, Japan
-
Kubovic Michal
Department of Electron Devices and Circuits , University of Ulm
-
Kazuyuki Hirama
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Hirama Kazuyuki
NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
-
Ebihara Yasuhiro
Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8571, Japan
-
Kubovic Michal
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Kubovic Michal
Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein Allee 45, D-89081 Ulm, Germany
-
Aleksov Aleksandar
Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein Allee 45, D-89081 Ulm, Germany
-
Yamauchi Yoshiharu
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Taniyasu Yoshitaka
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Yoshitaka Taniyasu
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Taniyasu Yoshitaka
NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
-
Kamiya Katsumasa
Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8571, Japan
-
Matsumoto Nobuo
Shonan Institute of Technology, 1-1-25 Nishi-Kaigan Tsujido, Fujisawa, Kanagawa 251-8511, Japan
-
Sasaki Satoshi
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
-
Shiraishi Kenji
Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8571, Japan
著作論文
- Nucleus and Spiral Growth Mechanisms of GaN Studied by Using Selective-Area Metalorganic Vapor Phase Epitaxy
- Multi-Atomic Steps on Metalorganic Chemical Vapor Deposition-Grown GaAs Vicinal Surfaces Studied by Atomic Force Microscopy
- RF Equivalent-Circuit Analysis of p-Type Diamond Field-Effect Transistors with Hydrogen Surface Termination
- Scanning Tunneling Microscopy Study of GaAs Step Structures on Vicirual Substrate Grown by Metalorganic Chemical Vapor Deposition
- Step-Free GaN Hexagons Grown by Selective-Area Metalorganic Vapor Phase Epitaxy
- Formation of Solid Solution of Al_Si_xN (0
- Influence of Lattice Constants of GaN and InGaN on Npn-type GaN/InGaN Heterojunction Bipolar Transistors
- Low-dislocation AlGaN thin films grown using Al_Si_xN nano-disks (x=0.07-0.17)
- Strained Thick p-InGaN Layers for GaN/InGaN Heterojunction Bipolar Transistors on Sapphire Substrates
- Nanoscale Patterning and Selective Growth of GaAs Surfaces by Ultra-High Vacuum Scanning Tunneling Microscopy ( Scanning Tunneling Microscopy)
- In-Situ STM Observation of GaAs Surfaces after Nitridation
- In-Situ STM Observation of GaAs Surfaces after Nitridation
- High-Temperature Characteristics of AlxGa1-xN-Based Vertical Conducting Diodes
- Properties of (111) Diamond Homoepitaxial Layer and Its Application to Field-Effect Transistor
- RF Performance of Diamond Metel–Semiconductor Field-Effect Transistor at Elevated Temperatures and Analysis of its Equivalent Circuit
- Growth and Device Properties of AlGaN/GaN High-Electron Mobility Transistors on a Diamond Substrate (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Enhancement and Stabilization of Hole Concentration of Hydrogen-Terminated Diamond Surface Using Ozone Adsorbates
- High Temperature Operation of Boron-Implanted Diamond Field-Effect Transistors
- Thermal Stabilization of Hole Channel on H-Terminated Diamond Surface by Using Atomic-Layer-Deposited Al_2O_3 Overlayer and its Electric Properties
- Diamond Field-Effect Transistors with 1.3A/mm Drain Current Density by AlO Passivation Layer (SELECTED TOPICS IN APPLIED PHYSICS : Diamond Semiconductors : from Materials to Devices)
- Arsenic-Doped n-Type Diamond Grown by Microwave-Assisted Plasma Chemical Vapor Deposition
- Hexagonal AlN(0001) Heteroepitaxial Growth on Cubic Diamond (001)
- Epitaxial Growth of AlGaN/GaN High-Electron Mobility Transistor Structure on Diamond (111) Surface
- Efficient Structure for Deep-Ultraviolet Light-Emitting Diodes with High Emission Efficiency: A First-Principles Study of AlN/GaN Superlattice
- Influence of Lattice Constants of GaN and InGaN on npn-Type GaN/InGaN Heterojunction Bipolar Transistors
- Strained Thick p-InGaN Layers for GaN/InGaN Heterojunction Bipolar Transistors on Sapphire Substrates
- Origin of Schottky Barrier Modification by Hydrogen on Diamond