The Nanotopography Effect of Improved Single-Side-Polished Wafer on Oxide Chemical Mechanical Polishing : Semiconductors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-04-15

著者

• Lee Won-mo

  Nano-soi Process Laboratory Hanyang University

• Paik U

  Department Of Ceramic Engineering Hanyang University

• Park J‐g

  Nano-soi Process Laboratory Hanyang University

• Park Jea-gun

  Nano-SOI Process Laboratory, Hanyang University

• KATOH Takeo

  Nano-SOI Process Laboratory, Hanyang University

• Jeon H

  Hanyang Univ. Seoul Kor

• Park Jea-gun

  Nano-soi Process Laboratory Hanyang University

• JEON Hyeongtag

  Department of Materials Science and Engineering, Hanyang University

• KATOH Takeo

  Advanced Semiconductor Material and Device Development Center, Hanyang University

• PARKf Jea-Gun

  Advanced Semiconductor Material and Device Development Center, Hanyang University

• LEE Won-Mo

  Department of Materials Science and Engineering, Hanyang University

• PAIK Un-Gyu

  Department of Ceramic Engineering. Hanyang University

• SUGA Hisaaki

  Mitsubishi Materials Silicon Corporation

• Park Jea-gun

  Advanced Semiconductor Material And Device Development Center Hanyang University

• Park Jea-gun

  Advanced Semiconductor Material & Device Development Center Hanyang University

• Katoh Takeo

  Nano-soi Process Laboratory Hanyang University

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