JEON Hyeongtag | Department of Materials Science and Engineering, Hanyang University
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概要
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- 同名の論文著者
- Department of Materials Science and Engineering, Hanyang Universityの論文著者
関連著者
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JEON Hyeongtag
Department of Materials Science and Engineering, Hanyang University
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Jeon H
Hanyang Univ. Seoul Kor
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PARK Jong-Wan
Department of Biomedical Sciences, Seoul National University, College of Medicine
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Lee Won-mo
Nano-soi Process Laboratory Hanyang University
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Paik U
Department Of Ceramic Engineering Hanyang University
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PARK Jong-Wan
Department of Physics, Chungbuk National University
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Park J‐g
Nano-soi Process Laboratory Hanyang University
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Park Jea-gun
Nano-SOI Process Laboratory, Hanyang University
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KATOH Takeo
Nano-SOI Process Laboratory, Hanyang University
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Park Jea-gun
Nano-soi Process Laboratory Hanyang University
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Lee Seoghyeong
Department Of Metallurgical Engineering Hanyang University
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Lee You-kee
Department Of Metallurgical Engineering Hanyang University
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Park Jea-gun
Advanced Semiconductor Material And Device Development Center Hanyang University
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LEE Sei-Hyun
Department of Metallurgical Engineering, Hanyang University
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CHOI Ji-Hwan
Department of Metallurgical Engineering, Hanyang University
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Katoh Takeo
Nano-soi Process Laboratory Hanyang University
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Park Jong-wan
Department Of Metallugical Engineering Hanyang University
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Cho Kwang-joon
Department Of Metallurgical Engineering Hanyang University
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Lee Jae-suk
Department Of Material Science And Engineering Kwangju Institute Of Science And Technology(k-jist)
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LEE Chongmu
Department of Materials Science and Engineering, Inha University
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KIM Jinwoo
Department of Chemistry and Chemistry Institute for Functional Materials, Pusan National University
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Paik Ungyu
Department Of Ceramic Engineering Hanyang University
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Lee Chongmu
Department Of Materiais Science And Engineering Inha University
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Lee Chongmu
Department Of Metallurgical Engineering Inha University
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Lee S‐h
Korea Univ. Seoul Kor
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KATOH Takeo
Advanced Semiconductor Material and Device Development Center, Hanyang University
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PARKf Jea-Gun
Advanced Semiconductor Material and Device Development Center, Hanyang University
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LEE Won-Mo
Department of Materials Science and Engineering, Hanyang University
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PAIK Un-Gyu
Department of Ceramic Engineering. Hanyang University
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SUGA Hisaaki
Mitsubishi Materials Silicon Corporation
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Lee Su-ho
School Of Electronic And Electrical Engineering Kyungpook National University. Korea
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CHO Kwang-Joon
Department of Metallurgical Engineering, Hanyang University
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LEE Jae-Suk
Department of Metallurgical Engineering, Hanyang University
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Lee J‐s
Kwangju Inst. Sci. And Technol. Kwangju Kor
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Park Jea-gun
Advanced Semiconductor Material & Device Development Center Hanyang University
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Park Jea-gun
Nano-soi Process Laboratory Department Of Electrical And Computer Engineering Hanyang University
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Ishida Makoto
Department Of Applied Chemistry & Biochemistry Faculty Of Engineering Kumamoto University
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Park Jong-wan
Department Of Metallurgical Engineering Hanyang University
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Jeon Hyeongtag
Department Of Metallurgical Engineering Cprc Hanyang University
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Jeon Hyeongtag
Department Of Metallurgical Engineering Hanyang University
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Sawada Kazuaki
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Choi J‐h
Osaka Univ. Osaka Jpn
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AHN Taehang
Department of Metallurgical Engineering, Hanyang University
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PARK Myounggu
Department of Metallurgical Engineering, Inha University
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Ahn Taehang
Department Of Metallurgical Engineering Hanyang University
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Park Myounggu
Department Of Metallurgical Engineering Inha University
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Okada Takayuki
Department Of Chemical And Biochemical Engineering Faculty Of Engineering Toyama University
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Kim Seokhoon
Department Of Computer Eng. Kyung Hee Univ.
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LEE Sukjae
Memory R & D Division, Hyundai Electronics Co., Ltd.
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LEE Hwackjoo
Microstructure Group, Korea Research Institute of Standards and Science
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Lee Hwackjoo
Microstructure Group Korea Research Institute Of Standards And Science
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Lee Sukjae
Memory R & D Division Hyundai Electronics Co. Ltd.
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Park Jong-Wan
Department of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seoungdong-ku, Seoul 133-791, Korea
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Woo Sanghyun
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Hong Hyungseok
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Hyungchul
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Bae Choelhwyi
System LSI division, Samsung Electronics Co., Ltd., Yongin, Gyeonggi-do 449-711, Korea
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Sawada Kazuaki
Department of Electric and Electronic Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580, Japan
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OKADA Takayuki
Department of Bio-Recycling, Faculty of Engineering, Hiroshima Kokusai Gakuin University
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Kim Jinwoo
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Cho Kwang-Joon
Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea
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Sawada Kazuaki
Department of Electric and Electronic Engineering, Toyohashi University of Technology
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Park Jong-Wan
Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Sei-Hyun
Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Seoghyeong
Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea
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Choi Ji-Hwan
Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea
著作論文
- Surfactant Effect on Oxide-to-Nitride Removal Selectivity of Nano-abrasive Ceria Slurry for Chemical Mechanical Polishing
- The Nanotopography Effect of Improved Single-Side-Polished Wafer on Oxide Chemical Mechanical Polishing : Semiconductors
- The Effects of Pretreatment, CH_4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films
- The Removal of Intentionally Contaminated Cu Impurities on Si Substrate Using Remote H-plasma Treatments
- Amorphous Titanium Silicide Phase Formation by Surface Microroughness on Si(100)
- Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
- The Effects of Pretreatment, CH4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films