The Effects of Pretreatment, CH4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films

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概要

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• Diamond thin films were deposited on p-type Si(100) wafers by microwave plasma enhanced chemical vapor deposition (MPECVD) using mixtures of H2, CH4 and O2 gases. Deposition was carried out at a substrate temperature of 900°C and a pressure of 40 Torr. In order to examine the effect of pretreatment on the film formation, SiC and diamond powders were used as pretreatment powders. Also, the methane gas ratio in the gas mixture was varied to observe its effect on the crystal structure of diamond films. Furthermore, the substrate bias effect on the diamond film formation was examined. Scanning electron microscopy (SEM), transmission electron microscopy (TEM) and Raman spectroscopy were utilized to characterize the microstructures of diamond thin films. The highest nucleus density was obtained by pretreatment with diamond powders of 40mbox-60 µm in size and a negative bias potential to the substrates. The deposited diamond films were found to contain many defects. The density of the defects increased with CH4 concentration in the gas mixtures. It is believed that the gas mixture with a high CH4 ratio must have promoted the formation of a graphite phase, probably due to the insufficient amount of atomic hydrogen acting as a selective etchant for graphite. Diamond films with good quality and a nucleus density of 108/cm2 could be deposited by utilizing the combined effects of a negative bias potential and a magnetic field.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1997-03-15

著者

• Lee Seoghyeong

  Department Of Metallurgical Engineering Hanyang University

• JEON Hyeongtag

  Department of Materials Science and Engineering, Hanyang University

• Lee You-kee

  Department Of Metallurgical Engineering Hanyang University

• LEE Sei-Hyun

  Department of Metallurgical Engineering, Hanyang University

• CHOI Ji-Hwan

  Department of Metallurgical Engineering, Hanyang University

• Cho Kwang-joon

  Department Of Metallurgical Engineering Hanyang University

• Lee Jae-suk

  Department Of Material Science And Engineering Kwangju Institute Of Science And Technology(k-jist)

• PARK Jong-Wan

  Department of Biomedical Sciences, Seoul National University, College of Medicine

• Cho Kwang-Joon

  Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea

• Park Jong-Wan

  Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea

• Lee Sei-Hyun

  Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea

• Lee Seoghyeong

  Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea

• Choi Ji-Hwan

  Department of Metallurgical Engineering, Hanyang University, Seoul 133-791, Korea

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