The Effects of Pretreatment, CH_4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-03-15
著者
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PARK Jong-Wan
Department of Physics, Chungbuk National University
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Jeon H
Hanyang Univ. Seoul Kor
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Lee S‐h
Korea Univ. Seoul Kor
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Lee Seoghyeong
Department Of Metallurgical Engineering Hanyang University
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JEON Hyeongtag
Department of Materials Science and Engineering, Hanyang University
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Lee Su-ho
School Of Electronic And Electrical Engineering Kyungpook National University. Korea
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Lee You-kee
Department Of Metallurgical Engineering Hanyang University
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LEE Sei-Hyun
Department of Metallurgical Engineering, Hanyang University
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CHO Kwang-Joon
Department of Metallurgical Engineering, Hanyang University
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LEE Jae-Suk
Department of Metallurgical Engineering, Hanyang University
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CHOI Ji-Hwan
Department of Metallurgical Engineering, Hanyang University
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Lee J‐s
Kwangju Inst. Sci. And Technol. Kwangju Kor
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Park Jong-wan
Department Of Metallugical Engineering Hanyang University
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Park Jong-wan
Department Of Metallurgical Engineering Hanyang University
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Cho Kwang-joon
Department Of Metallurgical Engineering Hanyang University
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Choi J‐h
Osaka Univ. Osaka Jpn
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Lee Jae-suk
Department Of Material Science And Engineering Kwangju Institute Of Science And Technology(k-jist)
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Park Jong-Wan
Department of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seoungdong-ku, Seoul 133-791, Korea
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PARK Jong-Wan
Department of Biomedical Sciences, Seoul National University, College of Medicine
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- The Effects of Pretreatment, CH4 Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films
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