Electroless Copper Deposition on H_2 Plasma-Treated TaN_x (x = 0-1) Diffusion Barriers

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-10-15

著者

• LEE Yong

  Division of Life Sciences, Korea Institute of Science and Technology

• KIM In

  Department of Radiation Oncology, Seoul National University College of Medicine

• Park J‐w

  Sungkyunkwan Univ. Suwon Kor

• Kim In

  Department Of Animal Resource And Sciences Dankook University

• Lee Y

  Department Of Metallurgical Engineering Yonsei University

• Park Jong-wan

  Division Of Materials Science And Engineering Hanyang University

• Hong Seok

  Division Of Materials Science And Engineering Hanyang University

• Lee You-kee

  Department Of Metallurgical Engineering Hanyang University

• Lee Yong

  Division Of Applied Life Science Graduate School Gyeongsang National University

• PARK Ki-Chul

  Samsung Electronics

• KIM Min

  Samsung Electronics

• Park J‐w

  Department Of Pharmacology Seoul National University College Of Medicine

• Kim In

  Department Of Meateials Science And Engineering Dona A University

• Kim Min

  Samsung Changwon Hospital, Sungkyunkwan University School of Medicine

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