Park Jong-wan | Division Of Materials Science And Engineering Hanyang University
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概要
関連著者
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Park Jong-wan
Division Of Materials Science And Engineering Hanyang University
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Hong Seok
Division Of Materials Science And Engineering Hanyang University
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YANG Sung-Hoon
Division of Materials Science and Engineering, Hanyang University
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Park J‐w
Department Of Pharmacology Seoul National University College Of Medicine
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Yang Sung-hoon
Division Of Materials Science And Engineering Hanyang University
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LEE Yong
Division of Life Sciences, Korea Institute of Science and Technology
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Park J‐w
Sungkyunkwan Univ. Suwon Kor
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Park J‐w
Pusan National Univ. Busan Kor
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Lee Y
Department Of Metallurgical Engineering Yonsei University
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Kim Seong-il
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Kim Yong
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Lee Seoghyeong
Tw-team Samsung Electronics
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Lee Seoghyeong
Division Of Materials Science And Engineering Hanyang University
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Sim Hyun
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Lee Yong
Division Of Applied Life Science Graduate School Gyeongsang National University
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Kim Dong
Semiconductor Lab, Samsung Advanced Institute of Technology, Samsung Electronics, Gyeonggi-do 446-712, Korea
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KIM In
Department of Radiation Oncology, Seoul National University College of Medicine
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Kim Yong
Semiconductor Materials and Devices Lab, Korea Institute of Science and Technology
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Kim In
Department Of Animal Resource And Sciences Dankook University
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Kim Y
Semiconductor Materials And Devices Laboratory Korea Institute Of Science And Technology
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Kim Seong-il
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Kim Y‐h
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Sim H
Korea Inst. Of Sci. And Technol. Seoul Kor
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Kim D
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Kim Dong
Semiconductor Materials Research Center Korea Institute Of Science And Technology
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SIM Hyun
Semiconductor Materials and Devices Lab., Korea Institute of Science and Technology
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LEE Seoghyeong
Division of Materials Science and Engineering, Hanyang University
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Lee You-kee
Department Of Metallurgical Engineering Hanyang University
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Kim S
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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MOON Hee-oo
Division of Materials Science and Engineering, Hanyang University
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Kim Dong
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Kim Yong
Korea Institute Of Science And Technology
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PARK Ki-Chul
Samsung Electronics
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KIM Min
Samsung Electronics
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KIM Heondo
Division of Materials Science and Engineering, Hanyang University
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Kim Heondo
Division Of Materials Science And Engineering Hanyang University
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Sim Hyun
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Kim In
Department Of Meateials Science And Engineering Dona A University
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Park Jong-Wan
Division of Materials Science and Engineering, Hanyang University
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Park Jong-Wan
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul, 133-791, Korea
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Moon Hee-Soo
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul, 133-791, Korea
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Hong Seok
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul 133-791, Korea
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Lee Seoghyeong
TW-Team, Samsung Electronics, Kyunggi-Do 449-711, Korea
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Park Jong-Wan
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul 133-791, Korea
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Yang Sung-Hoon
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul, 133-791, Korea
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Sim Hyun
Semiconductor Materials Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 136-791, Korea
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Kim Min
Samsung Changwon Hospital, Sungkyunkwan University School of Medicine
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Lee Seoghyeong
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul 133-791, Korea
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Kim Dong
Semiconductor Materials Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 136-791, Korea
著作論文
- Improvement of the Reliability of a Cu/W-N/SiOF Multilevel Interconnect by Inserting Plasma Enhanced Chemical Vapor Deposited W-N Thin Film
- Dielectric Constant Stability and Thermal Stability of Cu/Ta/SiOF/Si Multilayer Films
- Electroless Copper Deposition on H_2 Plasma-Treated TaN_x (x = 0-1) Diffusion Barriers
- Microstructure Evolution of the TaN_x (x = 0-1) Diffusion Barriers by NH_3 Plasma Treatment for the Electroless Copper Deposition
- Surface Modification of Low Dielectric Fluorinated Amorphous Carbon Films by Nitrogen Plasma Treatment : Electrical Properties of Condensed Matter
- Effect of Post-Plasma Treatment Time on the Properties of Low Dielectric Fluorinated Amorphous Carbon Films
- Effect of Post-Plasma Treatment Time on the Properties of Low Dielectric Fluorinated Amorphous Carbon Films
- Dielectric Constant Stability and Thermal Stability of Cu/Ta/SiOF/Si Multilayer Films
- Improvement of the Reliability of a Cu/W–N/SiOF Multilevel Interconnect by Inserting Plasma Enhanced Chemical Vapor Deposited W–N Thin Film
- Microstructure Evolution of the TaNx ($x=0--1$) Diffusion Barriers by NH3 Plasma Treatment for the Electroless Copper Deposition