YANG Sung-Hoon | Division of Materials Science and Engineering, Hanyang University
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概要
関連著者
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Park Jong-wan
Division Of Materials Science And Engineering Hanyang University
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YANG Sung-Hoon
Division of Materials Science and Engineering, Hanyang University
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Park J‐w
Pusan National Univ. Busan Kor
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Lee Seoghyeong
Tw-team Samsung Electronics
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MOON Hee-oo
Division of Materials Science and Engineering, Hanyang University
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KIM Heondo
Division of Materials Science and Engineering, Hanyang University
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Kim Heondo
Division Of Materials Science And Engineering Hanyang University
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Yang Sung-hoon
Division Of Materials Science And Engineering Hanyang University
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Park Jong-Wan
Division of Materials Science and Engineering, Hanyang University
著作論文
- Dielectric Constant Stability and Thermal Stability of Cu/Ta/SiOF/Si Multilayer Films
- Surface Modification of Low Dielectric Fluorinated Amorphous Carbon Films by Nitrogen Plasma Treatment : Electrical Properties of Condensed Matter
- Effect of Post-Plasma Treatment Time on the Properties of Low Dielectric Fluorinated Amorphous Carbon Films