Effect of Post Plasma Treatment on Reliability of Electron Cyclotron Resonance Chemical Vapor Deposited SiOF Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-12-30

著者

• PARK Jong-Wan

  Department of Physics, Chungbuk National University

• Lee Seoghyeong

  Department Of Metallurgical Engineering Hanyang University

• Park Jong-wan

  Department Of Metallugical Engineering Hanyang University

• Park Jong-Wan

  Department of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seoungdong-ku, Seoul 133-791, Korea

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