Effects of Chemical Interaction between Ta and SiOF on the Crystallinity of Cu and Ta in Cu/Ta/SiOF Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-01
著者
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Park J‐w
Pusan National Univ. Busan Kor
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PARK Jong-Wan
Department of Physics, Chungbuk National University
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Kim Young-il
Department Of Metallurgical Engineering Hanyang University
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Lee Seoghyeong
Tw-team Samsung Electronics
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Lee Seoghyeong
Department Of Metallurgical Engineering Hanyang University
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Yang S‐h
Hanyang Univ. Seoul Kor
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Park Jong-wan
Department Of Metallugical Engineering Hanyang University
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LEE Kyoung-Woo
Department of Metallurgical Engineering, Hanyang University
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YANG Sung-Hoon
Department of Metallurgical Engineering, Hanyang University
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Lee Kyoung-woo
Department Of Metallurgical Engineering Hanyang University
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Lee Kyoung-woo
Department Of Aquaculture Yosu National University
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KIM Young-Il
Department of Chemistry, Center for Molecular Catalysis, Seoul National University
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PARK Jong-Wan
Department of Biomedical Sciences, Seoul National University, College of Medicine
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