Effects of the Physical Characteristics of Cerium Oxide on Plasma-Enhanced Tetraethylorthosiliate Removal Rate of Chemical Mechanical Polishing for Shallow Trench Isolation

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概要

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• Ceria powders were synthesized by two different methods, solid-state displacement reaction and wet chemical precipitation, and the influence of the physical characteristics of cerium oxide on the removal rate of plasma-enhanced tetraethylorthosilicate (PETEOS) and chemical vapor deposition (CVD) nitride films in chemical mechanical planarization (CMP) was investigated. The fundamental physicochemical property and electrokinetic behavior of ceria particles in aqueous suspending media were investigated to identify the correlation between the colloidal property of ceria and the CMP performance. The surface potentials of two different ceria particles are found to have different isoelectric point (pHiep) values and differences in physical properties of ceria particles such as porosity and density were found to be the key parameters in CMP of PETEOS films. Ceria powders synthesized by the solid-state displacement reaction method yielded a higher removal rate of PETEOS and higher selectivity than powders synthesized by the wet chemical precipitation method.

• 2003-03-15

著者

• Paik Ungyu

  Department Of Ceramic Engineering Hanyang University

• Oh Seong-geun

  Department Of Chemical Engineering Hanyang University

• Kim Sang-kyun

  Department Of Ceramic Engineering Hanyang University

• Park Jea-gun

  Nano-soi Process Laboratory Department Of Electrical And Computer Engineering Hanyang University

• Katoh Takeo

  Nano-soi Process Laboratory Hanyang University

• Paik Ungyu

  Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea

• Park Yong-Kook

  Nano-SOI Process Laboratory, Hanyang University, Seoul 133-791, Korea

• Park Jea-Gun

  Nano-SOI Process Laboratory, Hanyang University, Seoul 133-791, Korea

• Katoh Takeo

  Nano-SOI Process Laboratory, Hanyang University, Seoul 133-791, Korea

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