Dependency of Precipitation of Interstitial Oxygen on Its Crystal Nature in Czochralski Silicon Wafer

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-08-15

著者

• Park J‐g

  Nano-soi Process Laboratory Hanyang University

• Park Jea-gun

  Nano Soi Process Laboratory Hanyang University

• Kwack Kae-dal

  Nano Soi Process Laboratory Hanyang University

• Park Jea-gun

  Advanced Semiconductor Material And Device Development Center Hanyang University

• Furuya Hisashi

  Crystaltechnology Division Sumitomo Mitsubishi Silicon Corporation

• Lee Gon-sub

  Nano Soi Process Laboratory Hanyang University

• PARK Ki-Hoon

  Nano SOI Process Laboratory, Hanyang University

• FURUKAWA Jun

  CrystalTechnology Division, Sumitomo Mitsubishi Silicon Corporation

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