Etching Characteristics and Mechanism of Ba_<0.7>Sr_<0.3>TiO_3 Thin Films in an Inductively Coupled Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-30

著者

• LEE Ming-Kwei

  Department of Electrical Engineering, National Sun Yat-sen University

• HORNG Ray-Hua

  Institute of Precision Engineering, National Chung Hsing University

• WUU Dong-Sing

  Institute of Electrical Engineering, Da-Yeh University

• LIAO Fang-Ching

  Institute of Electrical Engineering, Da-Yeh University

• KUO Nei-Hao

  Institute of Electrical Engineering, Da-Yeh University

• LEE Ming-Kwei

  Institute of Electrical Engineering, National Sun Yat-Sen University

• Horng R‐h

  National Chung Hsing Univ. Taichung Twn

• Lee M‐k

  National Sun Yat‐sen Univ. Kaohsiung Twn

• Horng Ray-hua

  Institute Of Precision Egineering National Chung Hsing University

• Kuo Nei-hao

  Institute Of Electrical Engineering Da-yeh University

• Wuu D‐s

  National Chung Hsing Univ. Taichung Twn

• Liao Fang-ching

  Institute Of Electrical Engineering Da-yeh University

• Wuu Dong-sing

  Institute Of Electrical Engineering Da-yeh University

• Horng Ray-Hua

  Institute of Electrical Engineering, Da-Yeh University, Chang-Hwa 515, Taiwan, ROC

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