Characterization of Large-Area AlGaInP/Mirror/Si Light-Emitting Diodes Fabricated by Wafer Bonding
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概要
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High-brightness AlGaInP/mirror/barrier/Si light-emitting diodes (LEDs) with vertical electrodes were fabricated using a wafer bonding technique. The high-thermal-conductivity Si substrate provides a better heat sink (compared with GaP or GaAs), which is a particularly important characteristic for high-power, large-area emitter applications. It allows for saturation of the small-area LED ($300\times 300$ μm2) after 150 mA injection and for the large-area LED ($1200\times 1200$ μm2) to increase output power even at 300 mA injection. The light output of the large-area vertical-conducting LED is mainly affected by the top-side (i.e., $n$-AlGaInP cladding) electrode design, where an interdigitated-finger electrode provides the better current spreading performance and prevents the current crowding problem. The extent of junction heating on LED samples ($300\times 300--1200\times 1200$ μm2) can also be evaluated from the corresponding electroluminescence spectra and emission-peak-wavelength driven by different injection current values. Finally, using a natural lithography technique, the mirror-substrate (MS) LEDs with textured surfaces present a brightness of 10 cd, which is about 4 cd brighter than that of the MS LED without a textured surface. With a combination of the MS wafer bonding and surface texturing techniques, thermal management in packaging becomes the key factor in further enhancing the external quantum efficiency of large-area LEDs under high flux operation.
- 2004-05-15
著者
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HUANG Shao-Hua
Department of Materials Engineering, National Chung Hsing University
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JIANG Yann-Zyh
Institute of Precision Engineering, National Chung Hsing University
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Horng Ray-hua
Institute Of Precision Egineering National Chung Hsing University
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Wuu Dong-Sing
Department of Electrical Engineering, Da-Yeh University
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Jiang Yann-Zyh
Institute of Precision Engineering, National Chung Hsing University, Taichung, Taiwan 402, ROC.
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Horng Ray-Hua
Institute of Precision Engineering, National Chung Hsing University, Taichung, Taiwan 402, ROC.
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Huang Shao-Hua
Department of Materials Engineering, National Chung Hsing University, Taichung, Taiwan 402, ROC.
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Horng Ray-Hua
Institute of Electrical Engineering, Da-Yeh University, Chang-Hwa 515, Taiwan, ROC
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