Characterization of Titanium Oxide Films Prepared by LIquid Phase Deposition Using Hexafluorotitanic Acid

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Characterization of Thermally Annealed Fluorinated Silicon Dioxide Films Prepared by Liquid-Phase Deposition
Properties of TiO_2 Thin Films on InP Substrate Prepared by Liquid Phase Deposition : Short Note
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Thermal Stability of Co-Sputtered Ru-Ti Alloy Electrodes for Dynamic Random Access Memory Applications
Preparation of Niobium-Doped Titanium Oxide Film by Liquid Phase Deposition
Characterization of Titanium Oxide Films Prepared by LIquid Phase Deposition Using Hexafluorotitanic Acid
The Protrusion of Liquid Phase Oxide Deposition on Patterned Silicon Wafer with Silicon Nitride as Mask
Etching Characteristics of (Ba, Sr)TiO_3 Thin Films in an Inductively Coupled Plasma
Conformal Step Coverage and Trench Filling of Liquid Phase Oxide Deposition
The Improvement of Liquid Phase Deposition of Silicon Dioxide with Hydrochlorie Acid Incorporation
Improvement of Effective Charges in Oxynitride Prepared by Liquid Phase Deposition on Silicon
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Electrical Improvement of Fluorine-Passivated Metal–Organic Chemical Vapor Deposited TiO2 Film on (NH4)2Sx-treated GaAs
Properties of TiO2 Thin Films on GaAs Prepared by Metalorganic Chemical Vapor Deposition
Properties of TiO_2 Thin Films on InP substrate Prepared by Metalorganic Chemical Vapor Deposition : Surfaces, Interfaces, and Films
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Improvement in Electrical Characteristics of Low-Pressure Chemical-Vapor-Deposited SiNx Dielectric Layer on GaN Substrate by Ammonium Sulfide Treatment
Enhancement of Ultraviolet and Visible Emissions of ZnO with Zn by Thermal Treatment
Gas-Assisted Focused Ion Beam Etching of Indium–Tin Oxide Film
Leakage Current Improvement of Liquid-Phase-Deposited TixSi1-xOy Films on Amorphous Silicon with Ammonium Hydroxide Incorporation by Postmetallization Annealing
Electrical Characteristics of Strontium Titanate Films Prepared by Liquid Phase Deposition
Stabilizing Light Emission of Porous Silicon by In-situ Treatment
Preparation of Niobium-Doped Titanium Oxide Film by Liquid Phase Deposition
Characteristics of Liquid-Phase-Deposited TiO2 Film on Hydrogenated Amorphous Silicon
Gas-Assisted Etching of Sapphire Using Focused Ion Beam
Very Low Leakage Current of High Band-Gap Al2O3 Stacked on TiO2/InP Metal--Oxide--Semiconductor Capacitor with Sulfur and Hydrogen Treatments
Utilization of GaAs Masking Layers for Formation of Patterned Porous Silicon
Characteristics of liquid phase deposited SiO

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