Preparation of Niobium-Doped Titanium Oxide Film by Liquid Phase Deposition
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概要
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Niobium-doped amorphous titanium oxide film can be deposited on a Corning glass substrate using a mixture of ammonium hexafluorotitanate, boric acid, niobium oxide and ammonium hydrogen fluoride aqueous solutions. After thermal annealing, the nanocrystallite niobium-doped titanium oxide film can be obtained. The smaller crystallite size of nanocrystallite niobium-doped titanium oxide than that of undoped-titanium oxide benefits the catalytic activity for sensing gas. A thin-film niobium-doped titanium oxide oxygen sensor with a higher sensitivity and a faster response is demonstrated.
- 2007-04-15
著者
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Fang Shih-chang
Department Of Electrical Engineering National Sun Yat-sen University
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Shih Chung-min
Department Of Electrical Engineering National Sun Yat-sen University
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Tu Hwei-fu
Department Of Electrical Engineering National Sun Yat-sen University
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Ho Chen-lin
Department Of Electrical Engineering National Sun Yat-sen University
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Lee Ming-kwei
Department Of Elecrrical Engineering National Sun Yat-sen University
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Shih Chung-Min
Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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Tu Hwei-Fu
Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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Fang Shih-Chang
Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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Lee Ming-Kwei
Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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Ho Chen-Lin
Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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