Characterization of Thermally Annealed Fluorinated Silicon Dioxide Films Prepared by Liquid-Phase Deposition

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Characterization of Thermally Annealed Fluorinated Silicon Dioxide Films Prepared by Liquid-Phase Deposition
Properties of TiO_2 Thin Films on InP Substrate Prepared by Liquid Phase Deposition : Short Note
Etching Characteristics and Mechanism of Ba_Sr_TiO_3 Thin Films in an Inductively Coupled Plasma
Thermal Stability of Co-Sputtered Ru-Ti Alloy Electrodes for Dynamic Random Access Memory Applications
Preparation of Niobium-Doped Titanium Oxide Film by Liquid Phase Deposition
Characterization of Titanium Oxide Films Prepared by LIquid Phase Deposition Using Hexafluorotitanic Acid
The Protrusion of Liquid Phase Oxide Deposition on Patterned Silicon Wafer with Silicon Nitride as Mask
Etching Characteristics of (Ba, Sr)TiO_3 Thin Films in an Inductively Coupled Plasma
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Multi-Mode Digital IF Downconverter for Software Radio Application(Software Defined Radio Technology and Its Applications)
Conformal Step Coverage and Trench Filling of Liquid Phase Oxide Deposition
The Improvement of Liquid Phase Deposition of Silicon Dioxide with Hydrochlorie Acid Incorporation
Improvement of Effective Charges in Oxynitride Prepared by Liquid Phase Deposition on Silicon
Flow-Rate Modulation Epitaxial Growth of Zn_Mg_yS_xSe_ on GaAs
Heteroepitaxial Growth of ZnSxSe1-x on GaAs0.6P0.4/GaAs by Metalorganic Vapor Phase Epitaxy
Flatness Improvement of GaAs Observed by Atomic Force Microscopy Using Flow Rate Modulation Epitaxy
Direct Bonding of Gallium Arsenide on Silicon
High-Quality SiO2 Grown on (NH4)2Sx-Treated GaAs by Liquid Phase Deposition
Electrical Improvement of Fluorine-Passivated Metal–Organic Chemical Vapor Deposited TiO2 Film on (NH4)2Sx-treated GaAs
Properties of TiO2 Thin Films on GaAs Prepared by Metalorganic Chemical Vapor Deposition
Properties of TiO_2 Thin Films on InP substrate Prepared by Metalorganic Chemical Vapor Deposition : Surfaces, Interfaces, and Films
Blue Light Emitting Diode
Effect of Nickel Concentration on Bias Reliability and Thermal Stability of Thin-Film Transistors Fabricated by Ni-Metal-Induced Crystallization
Optical Output Power Enhancement of Gallium Nitride Light-Emitting Diodes with Microlens Array on p-GaN Layer and Wave-Patterned Sidewalls by Gas-Assisted Focused Ion Beam Etching
Laser Chaos Induced by Delayed-Feedback and External Modulation
Improvement in Electrical Characteristics of Low-Pressure Chemical-Vapor-Deposited SiNx Dielectric Layer on GaN Substrate by Ammonium Sulfide Treatment
Enhancement of Ultraviolet and Visible Emissions of ZnO with Zn by Thermal Treatment
Gas-Assisted Focused Ion Beam Etching of Indium–Tin Oxide Film
Leakage Current Improvement of Liquid-Phase-Deposited TixSi1-xOy Films on Amorphous Silicon with Ammonium Hydroxide Incorporation by Postmetallization Annealing
Electrical Characteristics of Strontium Titanate Films Prepared by Liquid Phase Deposition
Stabilizing Light Emission of Porous Silicon by In-situ Treatment
Preparation of Niobium-Doped Titanium Oxide Film by Liquid Phase Deposition
Characteristics of Liquid-Phase-Deposited TiO2 Film on Hydrogenated Amorphous Silicon
Gas-Assisted Etching of Sapphire Using Focused Ion Beam
Very Low Leakage Current of High Band-Gap Al2O3 Stacked on TiO2/InP Metal--Oxide--Semiconductor Capacitor with Sulfur and Hydrogen Treatments
Utilization of GaAs Masking Layers for Formation of Patterned Porous Silicon
Characteristics of liquid phase deposited SiO

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