Effect of Nickel Concentration on Bias Reliability and Thermal Stability of Thin-Film Transistors Fabricated by Ni-Metal-Induced Crystallization
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Huang Jung-jie
Department Of Electrical Engineering National Sun Yat-sen University
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Wu Yewchung
Department Of Material Science And Engineering National Chiao Tung University
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Lai Ming-Hui
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, R.O.C.
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