Study of the DC Performance of Fabricated Magnetic Tunnel Junction Integrated on Back-End Metal Line of CMOS Circuits

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概要

• 論文の詳細を見る
• 2010-05-01

著者

• 小柳 光正

  東北大院工

• KAMIYANAGI Masashi

  CIR, Tohoku University

• IGA Fumitaka

  CIR, Tohoku University

• IKEDA Shoji

  RIEC, Tohoku University

• MIURA Katsuya

  Hitachi Advanced Research Laboratory

• HAYAKAWA Jun

  Hitachi Advanced Research Laboratory

• HASEGAWA Haruhiro

  RIEC, Tohoku University

• HANYU Takahiro

  RIEC, Tohoku University

• OHNO Hideo

  RIEC, Tohoku University

• ENDOH Tetsuo

  CIR, Tohoku University

• ENDOH Tetsuo

  Center for Interdisciplinary Research, Tohoku University

• Ohno Hideo

  Tohoku Univ. Sendai Jpn

• Endoh Testuo

  Center For Interdisciplinary Research Tohoku University

• Iga Fumitaka

  Cir Tohoku University

• Koyanagi Mitsumasa

  Cir Tohoku University

• Hasegawa Haruhiro

  Riec Tohoku University

• Endoh Tetsuo

  Tohoku Univ. Sendai‐shi Jpn

• Hanyu Takahiro

  Riec Tohoku University

• Mizunuma Kotaro

  Hitachi Advanced Research Laboratory

• Kamiyanagi Masashi

  Center For Interdisciplinary Research Tohoku University

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