Evaluation of 1/f noise characteristics in High-k/Metal Gate and SiON/Poly-Si Gate MOSFET (Electron devices)
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概要
- 論文の詳細を見る
- 2010-06-30
著者
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ENDOH Tetsuo
Center for Interdisciplinary Research, Tohoku University
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Imamoto Takuya
Center for Interdisciplinary Research, Tohoku University
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Sasaki Takeshi
Center for Interdisciplinary Research, Tohoku University
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