Enhancement-Mode n-Channel GaN MOSFETs Using HfO_2 as a Gate Oxide
スポンサーリンク
概要
- 論文の詳細を見る
We have fabricated enhancement-mode n-channel GaN MOSFETs with overlap gate structure on a p-GaN using thick HfO2 as a gate insulator. The maximum transconductance of 23mS/mm which is 4 times larger, to our knowledge, than the best-reported value of the normally-off GaN MOSFETs with SiO2 gate oxide has been obtained.
- (社)電子情報通信学会の論文
- 2008-07-01
著者
-
MIZUTANI Takashi
Department of Quantum Engineering, Nagoya University
-
Mizutani Takashi
Department Of Health Sciences Yamanashi Medical University
-
Mizutani Takashi
Department Of Quantum Engineering Nagoya University
-
KISHIMOTO Shigeru
Department of Quantum Engineering, Nagoya University
-
Tanaka Tsuyoshi
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
-
Ueda Tetsuzo
Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd
-
Kishimoto Shigeru
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
-
Terahara Takafumi
The Authors Are With Optoelectronic Systems Laboratory Network System Laboratories Fujitsu Laborator
-
Tanaka T
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
-
KURODA Masayuki
Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd
-
SUGIURA Shun
Department of Quantum Engineering, Nagoya University
-
Sugiura Shun
Department Of Quantum Engineering Nagoya University
-
Ueda Tetsuzo
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
-
Kuroda Masayuki
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
-
Mizutani Takashi
Department Of Electronics Faculty Of Engineering Nagoya University
-
Mizutani Takashi
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
-
Tanaka Tsuyoshi
Semiconductor Device Research Center Matsushita Electronics Corporation
関連論文
- First-Principles Calculation of Bandgap Bowing Parameter for Wurtzite InAlGaN Quaternary Alloy using Large Supercell
- Pre- and Post-Dispersion Compensation in Long-Haul WDM Transmission System
- High Alumina Co-Doped Silica EDFA and Its Gain-Equalization in Long-Haul WDM Transmission System
- Gain Equalizer in Long-Haul WDM Transmission System(Special Issue on High-Capacity WDM/TDM Networks)
- Ultra-Short Pulse Generators Using Resonant Tunneling Diodes and Their Integration with Antennas on Ceramic Substrates
- Metamorphic Resonant Tunneling Diodes and Its Application to Chaos Generator ICs
- Dual-Wavelength High-Power Laser Diodes Fabricated by Selective Fluidic Self-Assembly
- Dual wavelength high power laser diodes fabricated by Selective Fluidic Self-Assembly technique
- 色素増感太陽電池の等価回路解析
- 色素増感太陽電池の等価回路解析(有機エレクトロニクス・一般)
- Suppression of Hysteresis in Carbon Nanotube Field-Effect Transistors : Effect of Contamination Induced by Device Fabrication Process
- Fabrication of Carbon Nanotube Field Effect Transistors Using Plasma-Enhanced Chemical Vapor Deposition Grown Nanotubes
- Fabrication of Antigen Sensors Using Carbon Nanotube Field Effect Transistors
- Fabrication and Characterization of Peapod Field-Effect Transistors Using Peapods Synthesized Directly on Si Substrate
- Growth of High-Quality Carbon Nanotubes by Grid-Inserted Plasma-Enhanced Chemical Vapor Deposition for Field Emitters
- Effects of Fabrication Process on Current-Voltage Characteristics of Carbon Nanotube Field Effect Transistors
- Photoresponse of Carbon Nanotube Field-Effect Transistors
- Growth of mm-Long Carbon Nanotubes by Grid-Inserted Plasma-Enhanced Chemical Vapor Deposition
- Tunable Field-Effect Transistor Device with Metallofullerene Nanopeapods
- Growth of High-Quality Carbon Nanotubes by Grid-Inserted Plasma-Enhanced Chemical Vapor Deposition for Field Emitters
- Fluid Dynamic Assembly of Semiconductor Blocks for Heterogeneous Integration
- Fabrication Technique for Carbon Nanotube Single-Electron Transistors Using Focused Ion Beam
- Fabricated on a GaAs-based Semiconductor-on-Insulator Substrate Using a Spin-On Low-k Dielectric Film
- Position-Controlled Carbon Nanotube Field-Effect Transistors Fabricated by Chemical Vapor Deposition Using Patterned Metal Catalyst
- Large Gate Leakage Current in AlGaN/GaN High Electron Mobility Transistors
- Electroluminescence in AlGaN/GaN High Electron Mobility Transistors under High Bias Voltage (Short Note)
- Temperature Distribution Measurement in AlGaN/GaN High-Electron-Mobility Transistors by Micro-Raman Scattering Spectroscopy : Semiconductors
- AlGaN/GaN Heterostructure Metal-Insulator-Semiconductor High-Electron-Mobility Transistors with Si_3N_4 Gate Insulator
- Characterization of Electrical Properties of Micro-Schottky Contacts on Epitaxial Lateral Overgrowth GaN
- Fluidic Assembly of Thin GaAs Blocks on Si Substrates
- Comparison of Electrical Characteristics of Metamorphic HEMTs with InP HEMTs and PHEMTs
- Measurement of Frequency Dispersion of AlGaN/GaN High Electron Mobility Transistors
- Fabrication of vertically-aligned CNT electrodes using plasma-enhanced CVD for chemical sensors
- ポリフルオレン系材料による高分子EL素子の発光特性の検討
- リニア低密度ポリエチレンの空間電荷特性と電極効果
- LLDPEの空間電荷特性
- チーグラー触媒を用いて作製されたLDPEの空間電荷分布
- A questionnaire survey of hand dermatitis among Japanese nursing students
- Hand Dermatitis and Musculoskeletal Disorders among Female Nursing Students in Japan
- Interference Cancellation Characteristics of a BSCMA Adaptive Array Antenna with a DBF Configuration
- Implementation of a Digital Signal Processor in a DBF Self-Beam-Steering Array Antenna
- An ASIC Implementation Scheme to Realize a Beam Space CMA Adaptive Array Antenna
- High Breakdown Voltage of 10400V in AlGaN/GaN HFET with AlN passivation(Session6: Power Devices)
- High Breakdown Voltage of 10400V in AlGaN/GaN HFET with AlN passivation(Session6: Power Devices)
- Improved RF Characteristics of InGaP/GaAs HBTs by Using Novel Ledge Coupled Capacitor (LCC) Structure(Heterostructure Microelectronics with TWHM2003)
- A Compact Plastic Package with High RF Isolation by Subsidiary Inner Ground Leads (Special Issue on High-Frequency/speed Devices in the 21st Century)
- High-Frequency Measurements of Plasma Parameters in Electron Cyclotron Resonance Plasma Etchers(Nuclear Science, Plasmas, and Electric Discharges)
- ポリイミドの空間電荷特性に対する水分の影響
- AlGaN/GaN-based Millimeter Wave Monolithic ICs with Laser-Drilled Via-holes Through Sapphire(Session9B: GaN and SiC Device Process Technology)
- AlGaN/GaN-based Millimeter Wave Monolithic ICs with Laser-Drilled Via-holes Through Sapphire(Session9B: GaN and SiC Device Process Technology)
- Enhancement-Mode n-Channel GaN MOSFETs Using HfO_2 as a Gate Oxide
- Normally-off AlGaN/GaN MIS-HFETs Using Non-polar a-Plane
- Normally-off Operation of Non-polar AlGaN/GaN Heterojunction FETs Grown on R-plane Sapphire
- Temperature Compensation Technique of InGaP/GaAs Power HBT with Novel Bias Circuit Using Schottky Diodes(Joint Special Issue on Heterostructure Microelectronics with TWHM 2000)
- Advanced SOI Devices Using CMP and Wafer Bonding
- High-Speed Operation of a Novel Frequency Divider Using Resonant Tunneling Chaos Circuit
- Robust Operation of a Novel Frequency Divider Using Resonant Tunneling Chaos Circuit
- CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
- CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
- ITO基板上有機EL材料の基板表面処理による膜特性と多結晶化
- ITOの表面処理法の違いが有機EL素子特性に及ぼす影響
- Measurements of Electroluminescence Intensity Distribution in the Direction of Gate Width of n^+ Self-Aligned Gate GaAs Metal-Semiconductor Field-Effect Transistors
- Electroluminescence Measurement of n^+ Self-Alighed Gate GaAs MESFETs
- Electroluminescence Measurement of n Self-Aligned GaAs MESFETs
- Contact Potential Measurement of Carbon Nanotube by Kelvin Probe Force Microscopy
- ポリプロピレン共重合体フィルムの空間電荷と電気伝導特性
- EL差スペクトルを利用した有機ELの発光挙動解析(機能性有機薄膜・一般)
- Thermal Expansion Coefficient of Boron Monophosphide
- Cross-Sectional Potential Imaging of Compound Semiconductor Heterostructure by Kelvin Probe Force Microscopy
- Cross-Sectional Potential Imaging of Compound Semiconductor Heterostructure by Kelvin Probe Force Microscopy
- Kelvin Probe Force Microscopy for Potential Distribution Measurement of Cleaved Surface of GaAs Devices
- Kelvin Probe Force Microscopy for Potential Distribution Measurement of Cleaved Surface of GaAs Devices
- Normally-Off AlGaN/GaN HEMTs with Thin InGaN Cap Layer
- A GaAs SOI HEMT Fabricated by Fluidic Self-Assembly and Its Application to an RF-Switch
- Low-temperature growth of carbon nanotubes by grid-inserted plasma-enhanced chemical vapor deposition
- High Power and Stable Oscillations in the RTD Pair Oscillator ICs Fabricated with Metamorphic RTDs
- Novel Resonant Tunneling Diode Oscillator Capable of Large Output Power Operation(THz Devices,Heterostructure Microelectronics with TWHM2005)
- CsBrを電子注入材料とした有機EL素子の発光特性
- 半透明金属陽極を用いた有機LEDの特性
- Correlation between Change in PD Current Shapes and Ageing by the Oxidation of Void Surface
- Measurement of Cross-Sectional Potential of Compound Semiconductor Heterostructures in Vacuum Condition by Kelvin Probe Force Microscopy
- Measurement of Cross-Sectional Potential of Compound Semiconductor Heterostructures in Vacuum Condition by Kelvin Probe Force Microscopy
- bcl-2 Expression on Prostate Cancer and its Relationship to Cell Cycle and Prognosis
- Improvement of Breakdown Voltages in GaN Schottky Barrier Diodes by Pseudo-Superjunction Structures
- High-Speed and Low-Power n^+-p^+ Double-Gate SOI CMOS
- Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
- 異なる低密度ポリエチレン界面における空間電荷挙動
- Atomic Force Microscopy and Kelvin Probe Force Microscopy Measurements of Semiconductor Surface Using Carbon Nanotube Tip Fabricated by Electrophoresis
- AFM and KFM Measurements of Semiconductor Surface Using Carbon Nanotube Tip Fabricated by Electrophoresis
- Measurement of Cross-Sectional Potential of InAlAs/InGaAs Layered Structures in Vacuum by Kelvin Probe Force Microscopy
- Medium Scale Integrated Circuits Using Carbon Nanotube Thin Film Transistors
- High-Performance Top-Gate Carbon Nanotube Field-Effect Transistors and Complementary Metal-Oxide-Semiconductor Inverters Realized by Controlling Interface Charges
- A Delta-Sigma Analog-to-Digital Converter Using Resonant Tunneling Diodes(Semiconductors)
- Change in PD pulse shape with ageing
- Effect of Plaslma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition : Semiconductors
- Optoelectronic Flexible-Function Logic Gate Using Monostable-Bistable Transition of Serially Connected Resonant Tunneling Transistors
- Optoelectronic Flexible-Function Logic Gate Using Monostable-Bistable Transition of Serially Connected Resonant Tunneling Transistors
- Inhomogeneous Contact Potential Image of AlGaN/GaN Grown on Sapphire Substrate Measured by Kelvin Probe Force Microscopy : Semiconductors
- Characterization of Carbon Nanotube FETs by Electrostatic Force Microscopy(Session3: Emerging Devices I)
- Investigation of Interface Charges of High-k Gate Dielectrics and Their Effects on Carbon Nanotube Field-Effect Transistors