Mattausch Hans | Hiroshima Univ. Higashihiroshima‐shi Jpn
スポンサーリンク
概要
関連著者
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Mattausch Hans
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Mattausch Hans
Research Institute For Nanodevice And Bio Systems Hiroshima University
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Mattausch Hans
Hiroshima University
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Mattausch Hans
Research Center For Nanodevices And Systems Hiroshima University
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Koide Tetsushi
Research Institute For Nanodevice And Bio Systems Hiroshima University
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Koide Tetsushi
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Miura‐mattausch M
Hiroshima Univ. Higashi‐hiroshima Jpn
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Miura-mattausch Mitiko
Hiroshima-university
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MIURA-MATTAUSCH Mitiko
Hiroshima University
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MIYAKE Masataka
Hiroshima University
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Koide Tetsushi
Research Center For Nanodevices And Systems Hiroshima University
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Noda H
System Core Technology Div. System Solution Business Group Renesas Technology Co.
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Ueno Hiroki
Department Of Electrical And Electronic Engineering Chuo University
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Kumashiro Shigetaka
Semiconductor Technology Academic Research Center
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Kumashiro S
Ulsi Device Development Division Nec Corporation
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KOIDE Tetsushi
Research Center for Nanodevices and Systems, Hiroshima University
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Ueno H
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)matsushita Semi
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Noda H
Hitachi Ltd. Kokubunji‐shi Jpn
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Arimoto Kazutami
System Core Technology Div. Renesas Technology Corp.
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Dosaka K
System Core Technology Div. System Solution Business Group Renesas Technology Co.
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NAKAYAMA Noriaki
Tokyo Institute of Technology
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SADACHIKA Norio
Hiroshima University
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NAKAYAMA Noriaki
Institute for Chemical Research,Kyoto University
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Nakayama Noriaki
Semiconductor Technology Academic Research Center
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Ueno Hiroaki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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YAMAGUCHI Tetsuya
Semiconductor Technology Academic Research Center
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YAMASHITA Kyoji
Semiconductor Technology Academic Research Center
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Nakayama N
Department Of Advanced Materials Science And Engineering Faculty Of Engineering Yamaguchi University
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ISHIZAKI Masakatsu
Research Institute for Nanodevice and Bio Systems, Hiroshima University
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Ishizaki Masakatsu
Research Institute For Nanodevice And Bio Systems Hiroshima University
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Feldmann Uwe
Hiroshima Univ. Higashihiroshima‐shi Jpn
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NAKAYAMA Noriaki
Semiconductor Technology Academic Research Center(STARC)
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KUMAKI Takeshi
Research Institute for Nanodevice and Bio Systems, Hiroshima University
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Sadachika Norio
Hiroshima-university
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Tanaka Akihiro
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Kikuchihara Hideyuki
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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OHGURO Tatsuya
Semiconductor Technology Academic Research Center
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IIZUKA Takahiro
Semiconductor Technology Academic Research Center
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Saito Kazunori
System Core Technology Div. System Solution Business Group Renesas Technology Co.
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Ohguro Tatsuya
Department Of Physics Faculty Of Science Hokkaido University
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Dosaka Katsumi
System Core Technology Div. Renesas Technology Corp.
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Navarro Dondee
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Noda Hideyuki
System Core Technology Div. System Solution Business Group Renesas Technology Co.
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Mizoguchi Takeshi
Semiconductor Technology Academic Research Center
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MIURA-MATTAUSCH Mitiko
Graduate School of Advanced Science of Matter, Hiroshima University
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ARIMOTO Kazutami
System Core Technology Div. System Solution Business Group, Renesas Technology Co.
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Kono Yutaka
Network Memory Design Dept. System Solution Business Unit 4 System Solution Business Group Renesas T
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Ohguro Tatsuya
Semiconductor Company Toshiba Corporation
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Matsumoto S
Semiconductor Technology Academic Research Center
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NAVARRO Dondee
Graduate School of Advanced Sciences of Matter, Hiroshima University
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IIZUKA Takahiro
Hiroshima University
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ARIMOTO Kazutami
Renesas Technology
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NODA Hideyuki
Renesas Technology Corp.
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DOSAKA Katsumi
Renesas Technology Corp.
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Tanaka M
Department Of Electronics & Computer Engineering Gifu-university
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Inoue Kazunari
Custom Lsi Business Unit Custom Lsi Design Dept. 1 Renesas Technology Corporation
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Feldmann Uwe
Hiroshima University
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HORI Daisuke
Hiroshima University
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TAGUCHI Masahiko
Semiconductor Technology Academic Research Center
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MIYAMOTO Shunsuke
Semiconductor Technology Academic Research Center
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Morimoto Takashi
The Research Center For Nanodevices And Systems Hiroshima University
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Tanaka M
Department Of Electrical And Electronic Engineering Akita University
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HISAMITSU Kazuya
Graduate School of Advanced Sciences of Matter,Hiroshima University
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MATTAUSCH Mitiko
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Miura‐mattausch Mitiko
Hiroshima University
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ADACHI Hidekazu
the Research Center for Nanodevices and Systems, Hiroshima University
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KIRIYAMA Osamu
the Research Center for Nanodevices and Systems, Hiroshima University
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Kiriyama Osamu
The Research Center For Nanodevices And Systems Hiroshima University
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Adachi Hidekazu
The Research Center For Nanodevices And Systems Hiroshima University
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Dosaka Katsumi
Renesas Electronics Corp. Itami‐shi Jpn
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Hisamitsu Kazuya
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)fujitsu Laborat
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Arimoto Kazutami
Renesas Electronics Corp.
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SAKUDA Takashi
Hiroshima University
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ORITSUKI Yasunori
Hiroshima University
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MORISHITA Fukashi
Renesas Technology Corp.
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YOSHIHARA Tsutomu
Waseda University
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MATSUZAWA Kazuya
Semiconductor Technology Academic Research Center(STARC)
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Mattausch H
Hiroshima Univ. Higashi‐hiroshima‐shi Jpn
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Mattausch Hans
The Research Center For Nanodevices And Systems Hiroshima University
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Anami Kenji
Renesas Technology Corp.
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OKA Hideki
Fujitsu Laboratories Ltd.
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MIURA MATTAUSCH
Graduate School of Advanced Sciences of Matter, Hiroshima University
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MURAKAMI Takahiro
Hiroshima University
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TANABE Ryou
Fujitsu laboratories Ltd.
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SAHARA Yasuyuki
Semiconductor Technology Academic Research Center
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HOSHIDA Teruhiko
Semiconductor Technology Academic Research Center
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TSUKADA Toshiro
Semiconductor Technology Academic Research Center
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EZAKI Tatsuya
Graduate School of Advanced Science of Matter, Hiroshima University
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Nakayama Noriaki
Graduate School Of Advanced Science Of Matter Hiroshima University
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center
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Morikawa Keiichi
Semiconductor Technology Academic Research Center
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Morikawa Keiichi
Research Center For Nanodevices And Systems And Graduate School Of Advanced Sciences Of Matter Hiros
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Kobayashi Akiyoshi
Semiconductor Technology Academic Research Center
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Oka Hideki
Fujitsu Laboratories Ltd
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Kawano Hiroaki
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)matsushita Comm
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Kono Yutaka
Research Center For Nanodevices And Systems Hiroshima University
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Masuda Hiroo
Semiconductor Technology Academic Research Center (starc)
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Masuda Hiroo
Semiconductor Technology Academic Research Center
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Ezaki Tatsuya
Graduate School Of Advanced Science Of Matter Hiroshima University
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TANAKA Masayasu
Graduate School of Advanced Science of Matter, Hiroshima University
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Fujishima Kazuyasu
Ulsi Development Center Mitsubishi Electric Corp.
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Hosokawa Satoshi
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)ricoh Corporati
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YAMAOKA Takatoshi
Graduate School of Advanced Sciences of Matter,Hiroshima University
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MIZOGUCHI Takeshi
Graduate School of Advanced Sciences of Matter, Hiroshima University
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SUETAKE Masami
Graduate School of Advanced Sciences of Matter, Hiroshima University
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MATSUMOTO Shizunori
Graduate School of Advanced Sciences of Matter, Hiroshima University
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KITAMURA Toshihiko
Graduate School of Advanced Sciences of Matter, Hiroshima University
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UENO Hiroaki
Research Center for Nanodevices and Systems and Graduate School of Advanced Sciences of Matter, Hiro
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KITAMARU Daisuke
Research Center for Nanodevices and Systems and Graduate School of Advanced Sciences of Matter, Hiro
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TANAKA Masayasu
Research Center for Nanodevices and Systems and Graduate School of Advanced Sciences of Matter, Hiro
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OKAGAKI Takeshi
Research Center for Nanodevices and Systems and Graduate School of Advanced Sciences of Matter, Hiro
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MIURA-MATTAUSCHI Mitiko
Research Center for Nanodevices and Systems and Graduate School of Advanced Sciences of Matter, Hiro
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Suetake Masami
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)jfe Steel Corpo
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TAKEDA Youichi
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Miura Mattausch
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Takeda Youichi
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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KURODA Yasuto
Network Memory Design Dept., System Solution Business Unit 4, System Solution Business Group, Renesa
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GYOHTEN Takayuki
System Core Technology Div. System Solution Business Group, Renesas Technology Co.
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KURODA Yasuto
System Core Technology Div. System Solution Business Group, Renesas Technology Co.
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KURODA Yasuto
Research Center for Nanodevices and Systems, Hiroshima University
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NODA Hideyuki
Custom LSI Business unit, Custom LSI Design Dept. 1, Renesas Technology Corporation
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ARIMOTO Kazutami
Custom LSI Business unit, Custom LSI Design Dept. 1, Renesas Technology Corporation
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INOUE Kazunari
Renesas Technology Corp.
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FUJISHIMA Kazuyasu
Renesas Technology Corp.
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KOIDE Tetsushi
the Research Center for Nanodevices and Systems, Hiroshima University
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MORIMOTO Takashi
Research Center for Nanodevices and Systems, Hiroshima University
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KIRIYAMA Osamu
Research Center for Nanodevices and Systems, Hiroshima University
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ADACHI Hidekazu
Research Center for Nanodevices and Systems, Hiroshima University
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ITOH Satoshi
Semiconductor Technology Academic Research Center
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CHIBA Shingo
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Chiba Shingo
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Okagaki Takeshi
Research Center For Nanodevices And Systems And Graduate School Of Advanced Sciences Of Matter Hiros
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Ezaki Tatsuya
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Kitamaru Daisuke
Research Center For Nanodevices And Systems And Graduate School Of Advanced Sciences Of Matter Hiros
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Itoh Satoshi
Semiconductor Device Engineering Laboratory Toshiba Corporation
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Inoue Kazunari
Renesas Electronics Corporation
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Gyohten Takayuki
System Core Technology Div. System Solution Business Group Renesas Technology Co.
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Kanamoto Toshiki
Renesas Design Corp.
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Yamaoka Takatoshi
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)yokogawa Denki
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Morishita Fukashi
System Core Technology Div. Renesas Technology Corp.
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Kitamura Toshihiko
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)kyocera
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Yumisaki Akihiro
Hiroshima-university
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MIMURA Shu
Hiroshima-University
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JOHGUCHI Kou
Hiroshima-University
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KAYA Akihiro
Hiroshima-University
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Kawano H
Ntt Telecommunication Networks Lab. Musashino‐shi Jpn
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Tsukada Toshiro
Semiconductor & Integrated Circuits Group Hitachi Lid.
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Morishita Fukashi
Renesas Technology Corporation
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Yoshihara Tsutomu
Graduate School Of Information Production And Systems Waseda Univ.
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Tagami Masaharu
Research Institute For Nanodevice And Bio Systems Hiroshima University
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KUMAKI Takeshi
the Department of VLSI System Design, Ritsumeikan University
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Yokomichi Masahiro
Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
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Amakawa Shuhei
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Murakami Takahiro
HiSIM Research Center, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Miura-Mattausch Michiko
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Miura-Mattausch Mitiko
Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
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Masuda Hiroo
Renesas Electronics Corporation, Takasaki, Gunma 370-0021, Japan
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Sadachika Norio
Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
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Kajiwara Takahiro
Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
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Kanamoto Toshiki
Renesas Electronics Corporation, Takasaki, Gunma 370-0021, Japan
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Mattausch Hans
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Mattausch Hans
Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
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Saito Takashi
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Hayashi Takuro
Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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FUKUSHIMA Kenji
Hiroshima University
著作論文
- Acceleration of DCT Processing with Massive-Parallel Memory-Embedded SIMD Matrix Processor(Image Processing and Video Processing)
- Compact Double-Gate Metal-Oxide-Semiconductor Field Effect Transistor Model for Device/Circuit Optimization
- Degraded Frequency-Tuning Range and Oscillation Amplitude of LC-VCOs due to the Nonquasi-Static Effect in MOS Varactors
- Non-Quasi-Static Carrier Dynamics of MOSFETs under Low-Voltage Operation
- Circuit-Simulation Model of C_ Changes in Small-Size MOSFETs Due to High Channel-Field Gradients(the IEEE International Conference on SISPAD '02)
- A Compact Model of the Pinch-off Region of 100nm MOSFETs Based on the Surface-Potential(Semiconductor Materials and Devices)
- 1/f-Noise Characteristics in 100 nm-MOSFETs and Its Modeling for Circuit Simulation(Semiconductor Materials and Devices)
- Quantum Effect in Sub-0.1μm MOSFET with Pocket Technologies and Its Relevance for the On-Current Condition
- Circuit Simulation Models for Coming MOSFET Generations(Special Section of Selected Papers from the 14th Workshop on Circuits and Systems in Karuizawa)
- Integration Architecture of Content Addressable Memory and Massive-Parallel Memory-Embedded SIMD Matrix for Versatile Multimedia Processor
- Scalable FPGA/ASIC Implementation Architecture for Parallel Table-Lookup-Coding Using Multi-Ported Content Addressable Memory(Image Processing and Video Processing)
- Real-Time Huffman Encoder with Pipelined CAM-Based Data Path and Code-Word-Table Optimizer(Image Processing and Video Processing)
- A Reliability-Enhanced TCAM Architecture with Associated Embedded DRAM and ECC(Novel Device Architectures and System Integration Technologies)
- A CAM-Based Signature-Matching Co-processor with Application-Driven Power-Reduction Features(Integrated Electronics)
- Embedded Low-Power Dynamic TCAM Architecture with Transparently Scheduled Refresh(Memory, Low-Power LSI and Low-Power IP)
- Boundary-Active-Only Adaptive Power-Reduction Scheme for Region-Growing Video-Segmentation(Image Processing and Video Processing)
- Digital Low-Power Real-Time Video Segmentation by Region Growing
- 100 nm-MOSFET Model for Circuit Simulation : Challenges and Solutions(Devices and Circuits for Next Generation Multi-Media Communication Systems)
- Modeling of Reduced Surface Field Laterally Diffused Metal Oxide Semiconductor for Accurate Prediction of Junction Condition on Device Characteristics
- MOSFET Harmonic Distortion up to the Cutoff Frequency : Measurement and Theoretical Analysis
- Prediction of Circuit-Performance Variations from Technology Variations for Reliable 100nm SOC Circuit Design
- Software-Based Parallel Cryptographic Solution with Massive-Parallel Memory-Embedded SIMD Matrix Architecture for Data-Storage Systems
- Compact Modeling of Expansion Effects in LDMOS
- Laterally Diffused Metal Oxide Semiconductor Model for Device and Circuit Optimization
- Modeling of Trench-Gate Type HV-MOSFETs for Circuit Simulation
- Compact Modeling of Expansion Effects in LDMOS