MIURA-MATTAUSCH Mitiko | Graduate School of Advanced Science of Matter, Hiroshima University
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概要
関連著者
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MIURA-MATTAUSCH Mitiko
Graduate School of Advanced Science of Matter, Hiroshima University
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Ueno Hiroaki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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TANAKA Masayasu
Graduate School of Advanced Science of Matter, Hiroshima University
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Miyake Masataka
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Mattausch Hans
Research Center For Nanodevices And Systems Hiroshima University
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Navarro Dondee
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Miura‐mattausch M
Hiroshima Univ. Higashi‐hiroshima Jpn
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Sadachika Norio
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Miura-mattausch Mitiko
Hiroshima-university
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Mattausch Hans
Hiroshima Univ. Higashihiroshima‐shi Jpn
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Ueno Hiroki
Department Of Electrical And Electronic Engineering Chuo University
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Mattausch Hans
Hiroshima University
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IIZUKA Takahiro
Semiconductor Technology Academic Research Center
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Kumashiro Shigetaka
Semiconductor Technology Academic Research Center
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Nakayama Noriaki
Graduate School Of Advanced Science Of Matter Hiroshima University
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Matsushima Osamu
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Mattausch Hans
Research Institute For Nanodevice And Bio Systems Hiroshima University
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Ueno H
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)matsushita Semi
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NAKAYAMA Noriaki
Tokyo Institute of Technology
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TAGUCHI Masahiko
Semiconductor Technology Academic Research Center
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Kumashiro S
Ulsi Device Development Division Nec Corporation
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NAKAYAMA Noriaki
Institute for Chemical Research,Kyoto University
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Nakayama Noriaki
Semiconductor Technology Academic Research Center
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Morikawa Keiichi
Semiconductor Technology Academic Research Center
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Kobayashi Akiyoshi
Semiconductor Technology Academic Research Center
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Tanaka Masahiko
Core Technology Center Digital Media Network Company Toshiba Corporation
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Masuda Hiroo
Semiconductor Technology Academic Research Center (starc)
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Masuda Hiroo
Semiconductor Technology Academic Research Center
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Ezaki Tatsuya
Graduate School Of Advanced Science Of Matter Hiroshima University
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INOUE Tetsuhiro
Graduate School of Advanced Science of Matter, Hiroshima University
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ISA Takashi
Graduate School of Advanced Science of Matter, Hiroshima University
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YAMAGUCHI Tetsuya
Semiconductor Technology Academic Research Center
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YAMASHITA Kyoji
Semiconductor Technology Academic Research Center
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HARA Kiyohito
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Hara Kiyohito
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Nakayama N
Department Of Advanced Materials Science And Engineering Faculty Of Engineering Yamaguchi University
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ITOH Satoshi
Semiconductor Technology Academic Research Center
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Ohguro Tatsuya
Semiconductor Company Toshiba Corporation
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Itoh Satoshi
Semiconductor Device Engineering Laboratory Toshiba Corporation
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Miyake Masataka
HiSIM Research Center, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Mattausch Hans
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Tanaka Masayasu
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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NAVARRO Dondee
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Mattausch Hans
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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NAKAYAMA Noriaki
Semiconductor Technology Academic Research Center(STARC)
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Tanaka M
Department Of Electronics & Computer Engineering Gifu-university
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Mattausch H
Hiroshima Univ. Higashi‐hiroshima‐shi Jpn
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TANABE Ryo
Fujitsu Laboratories Ltd.
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MIURA MATTAUSCH
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Konno Kohkichi
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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MIYAMOTO Shunsuke
Semiconductor Technology Academic Research Center
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HOSHIDA Teruhiko
Semiconductor Technology Academic Research Center
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EZAKI Tatsuya
Graduate School of Advanced Science of Matter, Hiroshima University
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center
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Oka Hideki
Fujitsu Laboratories Ltd
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Kawano Hiroaki
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)matsushita Comm
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Tanaka M
Department Of Electrical And Electronic Engineering Akita University
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Suzuki Gaku
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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ISOBE Yoshioki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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HISAMITSU Kazuya
Graduate School of Advanced Sciences of Matter,Hiroshima University
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YAMAOKA Takatoshi
Graduate School of Advanced Sciences of Matter,Hiroshima University
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Isobe Yoshioki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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TAKEDA Youichi
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Miura-mattausch Mitiko
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Takeda Youichi
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Ezaki Tatsuya
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Tanaka Masayasu
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Yumisaki Akihiro
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Hisamitsu Kazuya
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)fujitsu Laborat
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Yamaoka Takatoshi
Graduate School Of Advanced Sciences Of Matter Hiroshima University:(present Address)yokogawa Denki
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Kawano H
Ntt Telecommunication Networks Lab. Musashino‐shi Jpn
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Ohyama Katsuroh
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Feldmann Uwe
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Kojima Takashi
Electronic Circuit Lab., Toyota Central R&D Labs., Inc., Nagakute, Aichi 480-1192, Japan
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Kajiwara Takahiro
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Miyake Masataka
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Ma Chenyue
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Yamaguchi Seiichiro
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Kinoshita Akinari
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Arakawa Takahiko
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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He Jin
Institute of Microelectronics, Peking University, Beijing 100871, China
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Amakawa Shuhei
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Toda Asato
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Higashiguchi Naoya
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Hori Daisuke
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Shintaku Yasuhiro
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Miura-Mattausch Mitiko
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Miura-Mattausch Mitiko
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Miura-Mattausch Mitiko
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Miura-Mattausch Mitiko
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
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Miura-Mattausch Mitiko
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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Ezaki Tatsuya
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Mizukane Yoshio
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Matsumoto Kenji
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Isa Takashi
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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Nakayama Noriaki
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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Ohguro Tatsuya
Semiconductor Technology Academic Research Center, 3-17-2 Shin-Yokohama, Minatokita-ku, Yokohama 222-0033, Japan
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Ohguro Tatsuya
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Sadachika Norio
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Sadachika Norio
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Sadachika Norio
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
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Hoshida Teruhiko
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Yumisaki Akihiro
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Takeda Yoichi
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Minami Takafumi
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Mattausch Hance
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Miyamoto Syunsuke
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Navarro Dondee
Graduate School of Advanced Sciences of Matter, 1-3-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8530, Japan
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Iizuka Takahiro
Semiconductor Technology Academic Research Center, 3-17-2 Shin-Yokohama, Minatokita-ku, Yokohama 222-0033, Japan
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Iizuka Takahiro
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Nakashima Junichi
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Taguchi Masahiko
Semiconductor Technology Academic Research Center, 3-17-2 Shin-Yokohama, Minatokita-ku, Yokohama 222-0033, Japan
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Taguchi Masahiko
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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UENO Hiroaki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Kojima Takashi
Electronic Circuit Lab., Toyota Central R&D Labs., Inc., Nagakute, Aichi 480-1192, Japan
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Ishimura Kenta
Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan
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Inoue Tetsuhiro
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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Kitamaru Daisuke
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
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Uetsuji Yasuhito
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
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Uetsuji Yasuhito
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
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Yamamoto Takao
Electronics Device Business Unit, DENSO Corporation, Kariya, Aichi 448-8661, Japan
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MATTAUSCH Hans
Research Center for Nanodevices and Systems, Hiroshima University
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Amakawa Shuhei
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Kitamaru Daisuke
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739–8526, Japan
著作論文
- A Self-Consistent Non-Quasi-Static MOSFET Model for Circuit Simulation Based on Transient Carrier Response
- High-Electric-Field Electron Transport at Silicon/Silicon-Dioxide Interface Inversion Layer
- Circuit-Simulation Model of C_ Changes in Small-Size MOSFETs Due to High Channel-Field Gradients(the IEEE International Conference on SISPAD '02)
- Circuit Simulation Models for Coming MOSFET Generations(Special Section of Selected Papers from the 14th Workshop on Circuits and Systems in Karuizawa)
- Shot noise modeling in metal-oxide-semiconductor field effect transistors under sub-threshold Condition
- 100 nm-MOSFET Model for Circuit Simulation : Challenges and Solutions(Devices and Circuits for Next Generation Multi-Media Communication Systems)
- Carrier Transport Model for Lateral p-i-n Photodiode in High-Frequency Operation
- 100 nm-MOSFET Model for Circuit Simulation : Challenges and Solutions
- Universal Relationship between Substrate Current and History Effect in Silicon-on-Insulator Metal--Oxide--Semiconductor Field-Effect Transistors
- Capability of Electrothermal Simulation for Automotive Power Application Using Novel Laterally Diffused Metal Oxide Semiconductor Model
- Dynamic-Carrier-Distribution-Based Compact Modeling of p--i--n Diode Reverse Recovery Effects
- Unified Reaction--Diffusion Model for Accurate Prediction of Negative Bias Temperature Instability Effect
- A Self-Consistent Non-Quasi-Static MOSFET Model for Circuit Simulation Based on Transient Carrier Response
- Surface-Potential-Based Metal–Oxide–Silicon-Varactor Model for RF Applications
- Suppressed Short-Channel Effect of Double-Gate Metal Oxide Semiconductor Field-Effect Transistor and Its Modeling
- Frequency Dependence of Measured Metal Oxide Semiconductor Field-Effect Transistor Distortion Characteristic
- Modeling of Subthreshold Swing and Analysis of Short-Channel Effects in Double-Gate Metal Oxide Semiconductor Field-Effect Transistors
- Compact Modeling of Floating-Base Effect in Injection-Enhanced Insulated-Gate Bipolar Transistor Based on Potential Modification by Accumulated Charge (Special Issue : Solid State Devices and Materials)
- Complete Surface-Potential-Based Fully-Depleted Silicon-on-Insulator Metal-Oxide-Semiconductor Field-Effect-Transistor Model for Circuit Simulation
- High-Electric-Field Electron Transport at Silicon/Silicon-Dioxide Interface Inversion Layer