Novel Optical Method for Widening Process Window of Phase-Modulated Excimer Laser Crystallization
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概要
- 論文の詳細を見る
A wide process window has been achieved for “the phase-modulated excimer-laser annealing” method of Si thin films. Ordinary and extraordinary light rays resulting from the birefringence effects of a crystal quartz plate, which is newly introduced within the optical path of the annealing system, generate a pair of projected images of a phase modulator. By adjusting their separation to be half the modulator pattern pitch, undesirable deformations, which appear in pair images owing to defocus, cancel each other out, resulting in a stable superposed image (light intensity profile) on the sample surface. It is shown by optical simulation and experiment that this “double-image method” widens the depth of focus from less than 2 μm to as wide as about $\pm 6$ μm.
- 2008-02-25
著者
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Taniguchi Yukio
Advanced Lcd Technologies Development Center Co. Ltd. (altedec)
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Ishiwara Hiroshi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Azuma Kazufumi
Advanced Lcd Technologies Development Center Co. Ltd.
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Matsumura Masakiyo
Advanced Lcd Technologies Development Center Co. Ltd.(altedec)
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Ishiwara Hiroshi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midori-ku, Yokohama 226-8503, Japan
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Endo Takahiko
Advanced LCD Technologies Development Center Co., Ltd., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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Endo Takahiko
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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