Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing
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概要
- 論文の詳細を見る
Characteristics have been investigated for both KrF excimer-laser light and KrF excimer-laser crystallization of Si thin films. The results were applied to design an optical system for growing densely packed and large grains. A high-resolution beam profiler confirmed that the laser light intensity distribution on the sample surface had a nearly ideal triangular form with a maximum-to-minimum intensity ratio of approximately 2, as designed. This distribution could grow 5-μm-long grains with a packing efficiency close to 100% by a single laser light pulse.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-02-15
著者
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Taniguchi Yukio
Advanced Lcd Technologies Development Center Co. Ltd. (altedec)
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KIMURA Yoshinobu
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC)
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Hiramatsu Masato
Advanced Lcd Technologies Development Center Co. Ltd.(altedec)
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Matsumura Masakiyo
Advanced Lcd Technologies Development Center Co. Ltd.(altedec)
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Jyumonji Masayuki
Advanced Lcd Technologies Development Center Co. Ltd.(altedec)
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Ogawa Hiroyuki
Advanced Lcd Technology Development Center Co. Ltd.
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Ogawa Hiroyuki
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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Hiramatsu Masato
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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Jyumonji Masayuki
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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Kimura Yoshinobu
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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