Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing

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Characterization of High-Performance Polycrystalline Silicon Complementary Metal-Oxide-Semiconductor Circuits
Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing
High-Resolution Beam Profiler for Engineering Laterally-Grown Grain Morphology(Electronic Displays)
High-Resolution Beam Profiler for Engineering Laterally-Grown Grain Morphology
Novel Optical Method for Widening Process Window of Phase-Modulated Excimer Laser Crystallization
New Phase Modulators for Next-Generation Low-Temperature Crystallization Method of Si Films
Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
Ultralong Silicon Grains Grown by Excimer Laser Crystallization
Ultrahigh-Performance Polycrystalline Silicon Thin-Film Transistors on Excimer-Laser-Processed Pseudo-Single-Crystal Films
Proposed Phase-Modulator Check System for Phase-Modulated Excimer-Laser Annealing
Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing
Pseudo-Single-Nucleus Lateral Crystallization of Si Thin Films
New Widening Method of Depth of Focus for Phase-Modulated Excimer-Laser Crystallization
Importance of Pure Si Films in Pulsed-Laser-Induced Lateral Growth

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