Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-06-15
著者
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JYUMONJI Masayuki
Advanced LCD Technology Development Center Co., Ltd.
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MATSUMURA Masakiyo
Advanced LCD Technology Development Center Co., Ltd.
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Nishitani Mikihiko
Advanced Lcd Technologies Development Center Co. Ltd. (altedec)
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HIRAMATSU Masato
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC)
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KIMURA Yoshinobu
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC)
関連論文
- Characterization of High-Performance Polycrystalline Silicon Complementary Metal-Oxide-Semiconductor Circuits
- Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
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- Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
- Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing
- Importance of Pure Si Films in Pulsed-Laser-Induced Lateral Growth