New Widening Method of Depth of Focus for Phase-Modulated Excimer-Laser Crystallization
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概要
- 論文の詳細を見る
The most important two demands for the "phase-modulated excimer-laser annealing" technology of Si thin films, that is, fine resolution and large "depth of focus" for the light-intensity profile projected on the sample surface, have been satisfied simultaneously by a newly proposed method. Both asymmetrical light diffraction effects of a sawtooth-wave phase modulator and oblique illumination to it modify effectively a pupil distribution, resulting in the improved stability of the projected image. A design method for the modulator is also presented. Optical simulations and crystallization experiments confirmed that the proposed method results in a depth of focus of as large as $\pm 6$ μm. Comparative discussion is also given between this method and the double-image method presented previously.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-01-25
著者
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Taniguchi Yukio
Advanced Lcd Technologies Development Center Co. Ltd. (altedec)
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Azuma Kazufumi
Advanced Lcd Technologies Development Center Co. Ltd.
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Matsumura Masakiyo
Advanced Lcd Technologies Development Center Co. Ltd.(altedec)
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Endo Takahiko
Advanced LCD Technologies Development Center Co., Ltd. (ALTEDEC), 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
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Endo Takahiko
Advanced LCD Technologies Development Center Co., Ltd., Yokohama 244-0817, Japan
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Matsumura Masakiyo
Advanced LCD Technologies Development Center Co., Ltd., Yokohama 244-0817, Japan
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Azuma Kazufumi
Advanced LCD Technologies Development Center Co., Ltd., Yokohama 244-0817, Japan
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