Reduced Leakage Current in BiFeO_3 Thin Films on Si Substrates Formed by a Chemical Solution Method
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-06-10
著者
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SINGH Sushil
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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ISHIWARA Hiroshi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ishiwara Hiroshi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Singh Sushil
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Singh Sushil
Tokyo Inst. Of Technol. Yokohama Jpn
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