ISHIWARA Hiroshi | Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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概要
- 同名の論文著者
- Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technologyの論文著者
関連著者
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ISHIWARA Hiroshi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ishiwara Hiroshi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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SINGH Sushil
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ishiwara H
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Singh Sushil
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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UCHIDA Hiroshi
Department of Materials and Life Sciences, Sophia University
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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KUROIWA Takeharu
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Uchida H
Department Of Chemistry Faculty Of Science And Technology Sophia University
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FUJISAKI Yoshihisa
Central Research Laboratory, Hitachi Ltd.
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PARK Byung-Eun
Department of Electrical and Computer Engineering, University of Seoul
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FURUKAWA Taisuke
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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KODA Seiichiro
Department of Chemistry, Faculty of Science and Technology, Sophia University
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Kim H‐s
Tokyo Inst. Technol. Yokohama Jpn
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UENO Risako
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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FUNAKUBO Hiroshi
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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ISHIKAWA Toru
R&D Association for Future Electron Devices
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KIM Hyun-Soo
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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SATO Takehiko
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Sato Keisuke
Fujitsu Laboratories Ltd.
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TAKAHASHI Kazuhiro
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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AIZAWA Koji
Precision & Intelligence Laboratory, Tokyo Institute of Technology
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Aizawa Koji
Department Of Information And Communication Engineering Kanazawa Institute Of Technology
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MARUYAMA Kenji
Fujitsu Laboratories Ltd.
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Aizawa Koji
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Singh Sushil
Tokyo Inst. Of Technol. Yokohama Jpn
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Park Byung-eun
Department Of Electrical And Computer Engineering University Of Seoul
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Kim Hyun-soo
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Takahashi Kazuhiro
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ishikawa Toru
R&d Association For Future Electron Devices
著作論文
- Dependence of Ferroelectric Properties on Thickness of BiFeO_3 Thin Films Fabricated by Chemical Solution Deposition
- Fabrication and Characterization of 1k-bit 1T2C-Type Ferroelectric Memory Cell Array
- 30-day-long Data Retention in Ferroelectric-gate FETs with HfO_2 Buffer Layers
- Fatigueless Ferroelectric Capacitors with Ruthenium Bottom and Top Electrodes Formed by Metalorganic Chemical Vapor Deposition
- Cr-Doping Effects to Electrical Properties of BiFeO_3 Thin Films Formed by Chemical Solution Deposition
- Reduced Leakage Current in BiFeO_3 Thin Films on Si Substrates Formed by a Chemical Solution Method