Doping Effect of Rare-Earth Ions on Electrical Properties of BiFeO3 Thin Films Fabricated by Chemical Solution Deposition

概要

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Rare-earth-ion (La and Nd)-doped BiFeO3 (BFO) thin films were fabricated by depositing sol–gel solutions on Pt/Ti/SiO2/Si(100) structures. It was found from X-ray diffraction analysis that BFO thin films were polycrystalline and 5 at. % La and Nd ion dopings did not cause structural changes in the BFO thin films. By 5 at. % La doping in BFO thin films, breakdown field increased and leakage current density in the high-electric-field region decreased, compared with those of undoped BFO thin films. Saturated polarization–electric field curves were obtained for La-doped BFO films at room temperature owing to the decreased leakage current density. At 80 K, the remanent polarization of the Nd-doped thin films was almost the same as that of the undoped film (approximately 90 μC/cm2), whereas that of the La-doped thin films was significantly lower (52 μC/cm2).
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2006-04-30