Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2 Gate Dielectric for Thin Film Transistors

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概要

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• Hydrogenated microcrystalline silicon (μc-Si:H) film was fabricated by inductively coupled plasma–chemical vapor deposition (ICP–CVD) at 150 °C on ZrO2 gate dielectric which was made by atomic layer deposition (ALD) method. μc-Si:H film with very thin incubation layer less than 10 nm was deposited on ZrO2 film. Polycrystalline ZrO2 played a role of crystal seed layer to enhance the crystalline fraction of μc-Si:H film. Surface roughness of ZrO2 film increased as deposition temperature of ZrO2 was increased. Rougher surface of ZrO2 film provided nucleation site of μc-Si:H film at early growth stage to reduce the thickness of the incubation layer. The crystalline fraction of μc-Si:H film depended on crystallinity of ZrO2. When μc-Si:H film was deposited on ZrO2 of 100 and 50 nm thickness at 250 °C, (200) and (111) peak intensity was increased respectively.

• 2006-05-30

著者

• Yun Sun

  Basic Research Laboratory Electronics And Telecommunications Research Institute

• Han Sang-myeon

  School Of Electrical Engineering Seoul National University

• Chung In-Jae

  LG.PHILIPS LCD R&D Center, 533, Hogae-dong, Dongan-gu, Anyang-shi, Kyongki-do 431-080, Korea

• Han Min-koo

  School Of Electrical Eng. & Computer Science #50 Seoul National University

• Han Chang-Wook

  School of Electrical Engineering #50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742, Korea

• Park Joong-Hyun

  School of Electrical Engineering #50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742, Korea

• Kim Ki-Yong

  LG.PHILIPS LCD R&D Center, 533 Anyang-shi, Anyang, Gyongki-do 431-080, Korea

• Lim Jung

  Basic Research Laboratory, Electronics and Telecommunications Research Institute, Daejeon 305-350, Korea

• Yun Sun

  Basic Research Laboratory, Electronics and Telecommunications Research Institute, Daejeon 305-350, Korea

• Han Sang-Myeon

  School of Electrical Engineering #50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742, Korea

• Chung In-Jae

  LG.PHILIPS LCD R&D Center, 533 Anyang-shi, Anyang, Gyongki-do 431-080, Korea

• Kim Ki-Yong

  LG.PHILIPS LCD R&D Center, 533 Anyang-shi, Anyang, Gyongki-do 431-080, Korea

• Han Min-Koo

  School of Electrical al Engineering and Computer Science #50, Seoul National University, Seoul 151-742, Korea

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