Time-Dependent Leakage Current Behavior of Integrated Ba_<0.7>Sr_<0.3>TiO_3 Thin Film Capacitors during Stressing
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-09-30
著者
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Inoue Atsuo
Electronics Research Laboratory Matsushita Electronics Corporation
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FUJII Eiji
Industrial Technology Center of Okayama Prefecture
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Inoue A
Mitsubishi Electric Corp. Itami‐shi Jpn
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Shimada Y
Tokyo Inst. Technol. Yokohama Jpn
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Shimada Yuji
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
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SHIMADA Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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NASU Toru
Electronics Research Laboratory, Matsushita Electronics Corporation
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NAGANO Yoshihisa
Electronics Research Laboratory, Matsushita Electronics Corporation
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MATSUDA Akihiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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ARITA Koji
Electronics Research Laboratory, Matsushita Electronics Corporation
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UMEMOTO Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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FUJII Eiji
Electronics Research Laboratory, Matsushita Electronics Corporation
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OTSUKI Tatsuo
Electronics Research Laboratory, Matsushita Electronics Corporation
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UEMOTO Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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ARITA Koji
ULSI Device Development Laboratory, NEC Corporation
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Nasu Toru
Electronics Research Laboratory Matsushita Electronics Corporation
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Otsuki T
Panasonic Technol. Inc. Co Usa
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Uemoto Y
Electronics Research Laboratory Matsushita Electronics Corporation
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Azuma M
Electronics Research Laboratory Matsushita Electronics Corporation
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Matsuda Akihiro
Electronics Research Laboratory Matsushita Electronics Corporation
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ASARI Koji
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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嶋田 豊
富山医科薬科大学医学部和漢診療学
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Otsuki Tatsuo
Electronics Research Laboratory Matsushita Electronics Corporation
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Nagano Yoshihisa
Electronics Research Laboratory Matsushita Electronics Corporation
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Shimada Yasuhiro
Electronics Research Laboratory Matsushita Electronice Corporation
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Asari Koji
The Authors Are With Electronics Research Laboratory Matsushita Electronics Corporation
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Inoue A
Microwave Device Development Department Mitsubishi Electric Corporation
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Fujii Eiji
First Department Of Oral And Maxillofacial Surgery Faculty Of Dentistry Tokyo Medical And Dental Uni
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Fujii Eiji
Research Laboratories Ii Tamanoi Vinegar Co. Ltd.
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Arita K
Ulsi Device Development Laboratory Nec Corporation
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