Study of Pt Bottom Electrodes using High-Temperature Sputtering for Ferroelectric Memories with SrBi_2Ta_2O_9 (SBTO) Film
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-07-15
著者
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FUJII Eiji
Industrial Technology Center of Okayama Prefecture
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NASU Toru
Electronics Research Laboratory, Matsushita Electronics Corporation
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FUJII Eiji
Electronics Research Laboratory, Matsushita Electronics Corporation
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OTSUKI Tatsuo
Electronics Research Laboratory, Matsushita Electronics Corporation
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UEMOTO Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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Nasu Toru
Electronics Research Laboratory Matsushita Electronics Corporation
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Otsuki T
Panasonic Technol. Inc. Co Usa
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Uemoto Y
Electronics Research Laboratory Matsushita Electronics Corporation
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Uemoto Yasuhiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Otsuki Tatsuo
Electronics Research Laboratory Matsushita Electronics Corporation
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Fujii Eiji
First Department Of Oral And Maxillofacial Surgery Faculty Of Dentistry Tokyo Medical And Dental Uni
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Fujii Eiji
Research Laboratories Ii Tamanoi Vinegar Co. Ltd.
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KIBE Masaki
Electronics Research Laboratory, Matsushita Electronics Corporation
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Kibe M
Matsushita Electronics Corp. Takatsuki Jpn
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Kibe Masaki
Electronics Research Laboratory Matsushita Electronics Corporation
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