Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
スポンサーリンク
概要
- 論文の詳細を見る
Thin films of nickel oxide (NiO) with NaCl-type structure were prepared on glass substrates at 400℃ by plasma-enhanced metalorganic chemical vapor deposition using nickel acetylacetonate as a source material. The relationship between O_2 flow rate, and preferred orientation and microstructure of the NiO films was investigated. Highly crystalline NiO film with (111) orientation was obtained at O_2 flow rates as low as 3 cm^3/min. As the O_2 flow rate increased from 3 to 70 cm^3/min, the orientation of NiO films changed from (111) to (100) and deposition rate decreased from 17 to 11 nm/min. Films with both (111) and (100) orientation had columnar structure. The origin of the preferred orientation of the NiO films was discussed.
- 社団法人応用物理学会の論文
- 1996-03-01
著者
-
FUJII Eiji
Industrial Technology Center of Okayama Prefecture
-
Takayama Ryoichi
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
-
Takayama Ryoichi
Human Environment Systems Development Center Matsushita Electric Industrial Co. Ltd.
-
Takayama Ryoichi
Human Environment Research Laboratory Matsushita Electric Industrial Co. Ltd
-
Fujii Eiji
First Department Of Oral And Maxillofacial Surgery Faculty Of Dentistry Tokyo Medical And Dental Uni
-
Fujii Eiji
Research Laboratories Ii Tamanoi Vinegar Co. Ltd.
-
Torii H
Human Environment Research Laboratory Matsushita Electric Industrial Co. Ltd.
-
TOMOZAWA Atsushi
Human Environment Systems Development Center, Matsushita Electric Industrial Co., Ltd.
-
FUJII Eiji
Human Environment Research Laboratory, Matsushita Electric Industrial Co., Ltd.
-
TORII Hideo
Human Environment Research Laboratory, Matsushita Electric Industrial Co., Ltd.
-
Tomozawa A
Human Environment Systems Development Center Matsushita Electric Industrial Co. Ltd.
-
TOMOZAWA Atsushi
Human Environment Research Laboratory, Matsushita Electric Industrial Co., Ltd.
関連論文
- Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
- Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
- Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
- Fabrication of hydroxyapatite with controlled morphology in a micro-reactor
- Time-Dependent Leakage Current Behavior of Integrated Ba_Sr_TiO_3 Thin Film Capacitors during Stressing
- Temperature-Dependent Current-Voltage Characteristics of Fully Processed Ba_Sr_TiO_3 Capacitors Integrated in a Silicon Device
- Si LSI Process Technology for Integrating Ferroelectric Capacitors ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Application of Ferroelectric Thin Films to Si Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
- Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Structure and morphology of aminopropyltriethoxysilane-modified TiO_2 nano-particles derived from sol-gel processing of tetraethylorthotitanate
- Novel One-pot Sol-Gel Preparation of Amino-functionalized Silica Nanoparticles
- 11-P-03 Preparation and Properties of Hydroxyapatite Powder with Metal Alkoxide
- Preparation of c-Axis Oriented Pb(Zr, Ti)O_3 Thin Films by RF-Magnetron Sputtering and their Dielectric and Piezoelectric Properties
- A New Cytotoxic Compound from a Water Extract of Corn
- Relationship between Pyroelectric Properties and Electrode Sizes in (Pb,La)(Zr,Ti)O_3 (PLZT) Thin Films
- Preparation and Pyroelectric Properties of (Pb, La)(Zr, Ti)O_3 (PL, ZT) Thin Films
- PREPARATION OF LANTHANUM-AND MAGNESIUM-MODIFIED LEAD TITANATE CERAMICS AND THIN FILMS, AND THEIR PYROELECTRIC PROPERTIES
- Study of Pt Bottom Electrodes using High-Temperature Sputtering for Ferroelectric Memories with SrBi_2Ta_2O_9 (SBTO) Film
- Far-Infrared Optical Properties of Quenched Germanium. : II. Magnetic Field Effects
- Far-Infrared Optical Properties of Quenched Germanium I.: The Temperature Dependence of the Absorption and the Photothermal Ionization Spectra
- Quantitative evaluation of consistency of early invasive carcinoma of the tongue
- Quantitative Evaluation of Consistency in Normal Mucosa, Leukoplakia, and Squamous Cell Carcinoma of the Gingiva
- Surface Electrical Potential of Spontaneously Poled La-Modified PbTiO_3 Thin Film by Kelvin Force Microscopy
- Recrystallization Mechanism for Solid Phase Growth of Poly-Si Films on Quartz Substrates : Special Section : Solid State Devices and Materials 2 : Silicon Devices and Process Technologies
- (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Analysis of Two Gene Clusters Involved in 2,4,6-Trichlorophenol Degradation by Ralstonia pickettii DTP0602