Preparation of c-Axis Oriented Pb(Zr, Ti)O_3 Thin Films by RF-Magnetron Sputtering and their Dielectric and Piezoelectric Properties
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-09-30
著者
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Kanno Isaku
Human Environmental Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Kamada Takeshi
Human Environmental Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Takayama Ryoichi
Human Environment Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Takayama Ryoichi
Human Environment Research Laboratory Matsushita Electric Industrial Co. Ltd
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Takayama Ryoichi
Human Environmental Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Fujii Satoru
Human Environmental Systems Development Center Matsushita Electric Industrial Co. Ltd.
関連論文
- Preparation of Pb-Based Ferroelectric Thin Films at Room Temperature Using Excimer-Laser-Assisted Multi-Ion-Beam Sputtering
- Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
- Preparation of Pyroelectric Pb_La_xTi_O_3 Thin Films from Ceramic Target by RF Magnetron Sputtering
- Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preparation of c-Axis Oriented Pb(Zr, Ti)O_3 Thin Films by RF-Magnetron Sputtering and their Dielectric and Piezoelectric Properties
- Relationship between Pyroelectric Properties and Electrode Sizes in (Pb,La)(Zr,Ti)O_3 (PLZT) Thin Films
- Preparation and Pyroelectric Properties of (Pb, La)(Zr, Ti)O_3 (PL, ZT) Thin Films
- PREPARATION OF LANTHANUM-AND MAGNESIUM-MODIFIED LEAD TITANATE CERAMICS AND THIN FILMS, AND THEIR PYROELECTRIC PROPERTIES
- Surface Electrical Potential of Spontaneously Poled La-Modified PbTiO_3 Thin Film by Kelvin Force Microscopy
- (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preparation of Co Ferrite Films by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition