Matsuda Akihiro | Electronics Research Laboratory Matsushita Electronics Corporation
スポンサーリンク
概要
関連著者
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Matsuda Akihiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Otsuki Tatsuo
Electronics Research Laboratory Matsushita Electronics Corporation
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Shimada Y
Tokyo Inst. Technol. Yokohama Jpn
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OTSUKI Tatsuo
Electronics Research Laboratory, Matsushita Electronics Corporation
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Otsuki T
Panasonic Technol. Inc. Co Usa
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Azuma M
Electronics Research Laboratory Matsushita Electronics Corporation
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嶋田 豊
富山医科薬科大学医学部和漢診療学
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Shimada Yasuhiro
Electronics Research Laboratory Matsushita Electronice Corporation
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Inoue Atsuo
Electronics Research Laboratory Matsushita Electronics Corporation
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Shimada Yuji
Microsystem Research Center Precision And Intelligence Laboratory Tokyo Institute Of Technology
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SHIMADA Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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ARITA Koji
Electronics Research Laboratory, Matsushita Electronics Corporation
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ARITA Koji
ULSI Device Development Laboratory, NEC Corporation
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Nasu Toru
Electronics Research Laboratory Matsushita Electronics Corporation
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Asari Koji
The Authors Are With Electronics Research Laboratory Matsushita Electronics Corporation
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Arita K
Ulsi Device Development Laboratory Nec Corporation
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FUJII Eiji
Industrial Technology Center of Okayama Prefecture
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Inoue A
Mitsubishi Electric Corp. Itami‐shi Jpn
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NASU Toru
Electronics Research Laboratory, Matsushita Electronics Corporation
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MATSUDA Akihiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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FUJII Eiji
Electronics Research Laboratory, Matsushita Electronics Corporation
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UEMOTO Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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Uemoto Y
Electronics Research Laboratory Matsushita Electronics Corporation
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Azuma Masamichi
Electronics Research Laboratory Matsushita Electronics Corporation
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ASARI Koji
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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Uemoto Yasuhiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Nagano Yoshihisa
Electronics Research Laboratory Matsushita Electronics Corporation
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Inoue A
Microwave Device Development Department Mitsubishi Electric Corporation
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Fujii Eiji
First Department Of Oral And Maxillofacial Surgery Faculty Of Dentistry Tokyo Medical And Dental Uni
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Fujii Eiji
Research Laboratories Ii Tamanoi Vinegar Co. Ltd.
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NAGANO Yoshihisa
Electronics Research Laboratory, Matsushita Electronics Corporation
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AZUMA Masamichi
Electronics Research Laboratory, Matsushita Electronics Corporation
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Azuma Mitsuhiro
Fujitsu Laboratories Limited
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Azuma Mitsuhiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Hayashi S
Matsushita Electronics Corp. Kyoto Jpn
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HAYASHI Shin-ichiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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MORIWAKI Nobuyuki
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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CHAYA Shigeo
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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Chaya Shigeo
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Hayashi Shose
Electronics Research Laboratory Matsushita Electronics Corporation
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Hayashi S
Tokyo Univ. Mercantile Marine Tokyo Jpn
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Moriwaki Nobuyuki
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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本田 雄士
日本電気(株)システムデバイス研究所
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本田 雄士
Nec基礎研究所
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Mcmillan Larry
Symetrix Corporation
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UMEMOTO Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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OISHI Yoshiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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SUZUOKA Nobuyuki
Microcomputer Division, Matsushita Electronics Corporation
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Hayashi Shinichiro
Electronics Research Laboratory, Matsushita Electronics Corporation
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Katsu Shin-ichi
Electronics Research Laboratory, Matsushita Electronics Corporation
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Kano Gota
Electronics Research Laboratory, Matsushita Electronics Corporation
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Araujo Carlos
Microelectronics Research Laboratory, University of Colorado
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Kano G
Electronics Research Laboratory Matsushita Electronics Corporation
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Kano Gota
Electronics Research Laboratory Matsushita Electronics Corporation
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Araujo Carlos
Microelectronics Research Laboratory University Of Colorado
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Katsu Shin-ichi
Electronics Research Laboratory Matsushita Electronics Corporation
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Nakao Kenji
Faculty Of Engineering Osaka University
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NAKAO Keisaku
Electronics Research Laboratory, Matsushita Electronics Corporation
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HIRANO Hiroshige
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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HONDA Toshiyuki
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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SUMI Tatsumi
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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TAKEO Masato
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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NAKANE George
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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NAKAKUMA Tetsuji
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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MUKUNOKI Toshio
The author is with Corporate Semiconductor Development Division, Matsushita Electric Industrial CO.,
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JUDAI Yuji
The authors are with ULSI Process Technology Development Center, Matsushita Electronics Corporation
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AZUMA Masamichi
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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SHIMADA Yasuhiro
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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OTSUKI Tatsuo
The authors are with Electronics Research Laboratory, Matsushita Electronics Corporation
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CHAYA Shigeo
ULSI Process Technology Development Center, Matsushita Electronics Corporation
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MORIWAKI Nobuyuki
ULSI Process Technology Development Center, Matsushita Electronics Corporation
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JUDAI Yuji
Kyoto Research Laboratory, Matsushita Electronics Corporation
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ITO Toyoji
Kyoto Research Laboratory, Matsushita Electronics Corporation
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TAKEO Masato
Kyoto Research Laboratory, Matsushita Electronics Corporation
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FUJI Eiji
Electronics Research Laboratory, Matsushita Electronics Corporation
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SUMI Tadashi
the System LSI Laboratory, Mitsubishi Electric Corporation
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Oishi Yoshiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Suzuoka Nobuyuki
Microcomputer Division Matsushita Electronics Corporation
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Hayashi Shinichiro
Electronics Research Laboratory Matsushita Electronics Corporation
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Honda T
System Devices Research Laboratories Nec Corporation
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Judai Yuji
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Nakao K
Electronics Research Laboratory Matsushita Electronics Corporation
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Sumi T
The Authors Are With Electronics Research Laboratory Matsushita Electronics Corporation
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Takeo Masato
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Sumi Tatsumi
Kyoto Research Laboratory Matsushita Electronics Corporation
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Hirano Kanji
Kyoto Research Laboratory Matsushita Electronics Corporation
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Nakane George
The Authors Are With Electronics Research Laboratory Matsushita Electronics Corporation
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Sato Yasuyuki
Fujitsu Laboratories Limited
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Mikawa Takumi
Kyoto Research Laboratory Matsushita Electronics Corporation
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Murakami Koso
Fujitsu Laboratories Limited
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Chujo T
Fujitsu Lab. America Ca Usa
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Chujo Takafumi
Fujitsu Laboratories
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Honda T
Fukuoka Univ. Fukuoka Jpn
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Mukunoki Toshio
The Author Is With Corporate Semiconductor Development Division Matsushita Electric Industrial Co. L
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Azuma Masamichi
The Authors Are With Electronics Research Laboratory Matsushita Electronics Corporation
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Judai Yuji
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Fujii Yasuki
FUJITSU LABORATORIES LIMITED
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Fujii Y
Nihon Univ. Funabashi‐shi Jpn
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Hirano Hiroshige
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Nakakuma Tetsuji
The Authors Are With Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Murakami K
Osaka Univ. Suita‐shi Jpn
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Arita Koji
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Nasu Toru
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Sumi Tatsumi
Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo-Kasugacho, Minamiku, Kyoto 601, Japan
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Takeo Masato
Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo-Kasugacho, Minamiku, Kyoto 601, Japan
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Ito Toyoji
Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo-Kasugacho, Minamiku, Kyoto 601, Japan
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Hayashi Shin-ichiro
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Hirano Kanji
Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo-Kasugacho, Minamiku, Kyoto 601, Japan
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Matsuda Akihiro
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Judai Yuji
Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo-Kasugacho, Minamiku, Kyoto 601, Japan
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Otsuki Tatsuo
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Inoue Atsuo
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Nagano Yoshihisa
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
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Shimada Yasuhiro
Electronics Research Laboratory, Matsushita Electronics Corporation, 1-1 Saiwai-cho, Takatsuki, Osaka 569, Japan
著作論文
- Time-Dependent Leakage Current Behavior of Integrated Ba_Sr_TiO_3 Thin Film Capacitors during Stressing
- Temperature-Dependent Current-Voltage Characteristics of Fully Processed Ba_Sr_TiO_3 Capacitors Integrated in a Silicon Device
- Si LSI Process Technology for Integrating Ferroelectric Capacitors ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Application of Ferroelectric Thin Films to Si Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
- Ferroelectric Memory Circuit Technology and the Application to Contactless IC Card(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Retention Characteristics of a Ferroelectric Memory Based on SrBi_2(Ta, Nb)_2O_9
- Network Restoration Algorithm for Multimedia Communication Services and Its Performance Characteristics
- Ferroelectric Nonvolatile Memory Technology and Its Applications