Effect of CdTe Layer Thickness on Hg_<1-x>Cd_xTe Epilayer Growth by Isothermal Vapor Phase Epitaxy Using (100) CdTe/GaAs Substrates and Void Formation at the Interface
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-07-15
著者
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ISSHIKI Minoru
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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Wang Jun
National Institute Of Materials And Chemical Research
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Isshiki Minoru
Research Institute Of Mineral Dressing And Metallurgy Tohoku University
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Isshiki Minoru
Instite For Advanced Materials Processing Tohoku University
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Ishikawa Y
Research Center For Interface Quantum Electronics And Graduate School Of Electronics And Information
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Ishikawa Y
Dowa Mining Co. Ltd. Tokyo
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ISHIKAWA Yukio
Institute for Advanced Materials Processing, Tohoku University
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Ishikawa Y
Hokkaido Univ. Sapporo Jpn
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Wang J
State Key Laboratory Of Crystal Materials Shandong University
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Wang J
Interdisciplinary Gt-aduate School Of Engineering Sciences Kyushu University
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KOO Bonheun
Institute for Advanced Materials Processing, Tohoku University
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WANG Jifeng
Institute for Advanced Materials Processing, Tohoku University
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Wang Jifeng
Institute For Advanced Materials Processing Tohoku University
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Koo Bonheun
Institute For Advanced Materials Processing Tohoku University
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Ishikawa Yukio
Instite For Advanced Materials Processing Tohoku University
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