As Preamorphization of the Predeposited Amorphous Si Layer for the Formation of the Silicided Ultra Shallow p^+-n Junction

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-01-30

著者

• Lee J

  School Of Electrical Engineering Seoul National University

• Kim Young

  Applied Physics Group Korea Institute Of Science And Technology

• Kim Y

  Sungkyukwan Univ. Kyunggi‐do Kor

• Lee Jae

  Korea Research Institute Of Chemical Technology

• KWON SANG

  Department of Internal Medicine and Institute of Lifelong Health, Yonsei University Wonju College of

• Chun Kuk

  Isrc Seoul National University

• Kwon Sang

  Dept. Of Electronics Eng. Kyungwon Univ.

• Lee Jong

  Inter-university Semiconductor Research Center And School Of Electrical Engineering Seoul National U

• KIM Yeo

  ISRC, Seoul National University

• CHUN Kuk

  ISRC, Seoul National University

• LEE Jong

  ISRC, Seoul National University

• Kwon Sang

  Department Of Dermatology Hanyang University College Of Medicine

• Kwon Sang

  Department Of Chemistry Yeungnam University

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