大気圧プラズマCVD法によるアモルファスSiの高速成膜に関する研究(第3報) : 高速形成a-Si薄膜の電気・光学特性

概要

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Electrical and optical properties of amorphous silicon (a-Si) films fabricated at very high deposition rate using an atmospheric pressure plasma CVD method with rotary electrode were evaluated for applying to the electric devices. As the results, it was found that a-Si films with this method have good properties such as high photo sensitivity (δ_<ph>/δ_d〜10^6 at deposition rate of 0.3μm/s). And the optical gap (E_<opt>; determined (αhv)^<1/3> versus hv plot) was about 1.5 - 1.6 eV which were similar to those of a-Si films fabricated by the conventional plasma CVD method at low pressure. With increasing the deposition rate the E_<opt> decreased and the hydrogen content in the a-Si films increased, and this tendency was contrary to that of the general a-Si films. These results indicate that the structure of a-Si films with this method include much disorder configuration which narrowed the E_<opt>. However, enough hydrogen in the films terminated the dangling bonds and caused the reduction of defect density. In conclusion, it was thought that the atmospheric pressure plasma CVD method could fabricate the device grade a-Si film at very high deposition rate.
公益社団法人精密工学会の論文
2001-05-05