超純水のみによる電気化学的加工法の研究 : 陰極表面における加工現象

概要

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In order to develop a new ultra-precision and ultra-clean machining method, we studied electrochemical machining in ultrapure water. In this paper, we newly performed electrochemical machining in ultrapure water under the cathode specimen condition to understand the interaction with H atom. We found that Al and Si specimen whose surfaces are oxidized under the anode condition are etched off under the cathode condition. It was also confirmed that pH value near the cathode is basic (pH=9) in the experiment. These results indicated that OH molecule is generated at cathode surface, which is concerned in the etching mechanism of cathode surface with H atom. As the result of these experiment, we proposed that etching mechanism of cathode specimen condition is as follows, (1) Adsorption of H atoms on the cathode surface, (2) Generation of OH molecules at cathode surface, (3) Chemisorption of OH molecules to the H-adsorbed cathode surface and etching off the surface atom.
社団法人精密工学会の論文
2002-09-05