Microscopic Effect of Nitrogen Doping on Dielectric Constant of Hf-silicate

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• UDA Tsuyoshi

  AdvanceSoft Corporation

• CHIKYOW Toyohiro

  National Institute for Mateirals Science

• Umezawa Naoto

  National Inst. For Materials Sci. Ibaraki Jpn

• SHIRAISHI Kenji

  Institute of Physics, University of Tsukuba

• Yamamoto Takenori

  Advancesoft Corporation

• OHNO Takahisa

  National Institute for Materials Science (NIMS)

• Chikyow Toyohiro

  National Institute For Materials Science

• Ohno T

  National Research Institute For Metals

• Ohno Takahisa

  National Institute For Materials Science

• Ohno Takahisa

  Computational Materials Science Center National Institute For Materials Science

• Ohno Takahisa

  National Research Institute For Metals

• MOMIDA Hiroyoshi

  Institute of Industrial Science, University of Tokyo

• HAMADA Tomoyuki

  Institute of Industrial Science, University of Tokyo

• Umezawa Naoto

  National Institute For Materials Science

• Ohno Takahisa

  First Principles Simulation Group Computational Materials Science Center National Institute For Mate

• Hamada Tomoyuki

  Institute Of Industrial Science University Of Tokyo

• Momida Hiroyoshi

  Institute Of Industrial Science University Of Tokyo

• Chikyow Toyohiro

  National Inst. Materials Sci. Ibaraki Jpn

• Shiraishi Kenji

  Institute Of Physics University Of Tsukuba

• Ohno Takahisa

  Science University Of Tokyo

• Uda Tsuyoshi

  Advanced Research Laboratory Hitachi Ltd.

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