Phenomenological Theory of Semiconductor Epitaxial Growth with Misfit-Dislocations
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-09-15
著者
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Takeda K
Hitachi Ltd. Hitachi Research Laboratory
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Oyama N
Plasma Research Center University Of Tsukuba
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OHTA Eiji
Keio University
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OHTA Eiji
Department of Material Science, Faculty of Science and Technology, Keio University
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TAKEDA Kyozaburo
Department of Materials Science and Engineering, Waseda University
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SHIRAISHI Kenji
NTT Basic Research Laboratories
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Takeda Kazuyuki
Department Of Energy Conversion Kyushu University
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OHNO Takahisa
National Institute for Materials Science (NIMS)
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Ohta E
Keio University
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Ohta Eiji
Department Of Agricultural Chemistry Faculty Of Agriculture Kyoto University
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Ohno T
National Research Institute For Metals
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Ohno Takahisa
National Institute For Materials Science
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Ohno Takahisa
Computational Materials Science Center National Institute For Materials Science
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Ohno Takahisa
National Research Institute For Metals
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Oyama Norihisa
Department Of Applied Physics And Phisico-infomatics Keio University
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OKAJIMA Ko
Department of Materials Science and Engineering, Waseda University
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Okajima Ko
Department Of Materials Science And Engineering Waseda University
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Ohno Takahisa
First Principles Simulation Group Computational Materials Science Center National Institute For Mate
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Takeda Kyozaburo
Department Of Materials Science And Engineering School Of Science And Engineering Waseda University
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Ohno Takahisa
Science University Of Tokyo
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Takeda Kyozaburo
Department of Electrical Engineering and Bioscience, Graduate School of Advanced Science and Engineering, Waseda University, Shinjuku, Tokyo 169-8555, Japan
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