First-Principles Study of the Oxide Growth Process on Silicon Surfaces and at Silicon-Oxide/Silicon Interfaces

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概要

• 論文の詳細を見る
• 1998-09-07

著者

• KAGESHIMA Hiroyuki

  NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation

• SHIRAISHI Kenji

  NTT Basic Research Laboratories

• Kageshima Hiroyuki

  Ntt Basic Research Laboratories

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