Tight-Binding Approach to Initial Stage of the Graphitization Process on a Vicinal SiC Surface
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概要
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We study the process of growth of graphene by the SiC surface decomposition method to improve the technique of growing graphene. In this study, the initial stage of the graphitization process on a periodically faceted SiC surface is investigated by the Naval Research Laboratory tight-binding approach. The results suggest that the decomposition of the SiC surface started by the desorption of Si atoms at the step edge. It is also found that released C atoms are trapped at the step-edge sites and that neighboring Si atoms are subsequently desorbed. These results suggest that graphene nucleation on the SiC surface proceeds in a negative step-flow mode.
- 2011-03-25
著者
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Kakimoto Koichi
Research Instittue For Applied Mechanics Kyushu University
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Kageshima Hiroyuki
Ntt Basic Research Laboratories
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Wakabayashi Katsunori
International Center for Materialas Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Wakabayashi Katsunori
International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Kangawa Yoshihiro
Research Institute for Applied Mechanics, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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INOUE Masato
Deparatment of Occupational Health, Graduate School of Medicine, Gifu University
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Inoue Masato
Department of Aeronautics and Astronautics, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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