Observation of Low-Temperature Elastic Softening due to Vacancy in Crystalline Silicon(Condensed Matter: Structure, Mechanical and Thermal Properties)
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概要
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In challenging a direct observation of the vacancy in crystalline silicon, we have carried out low-temperature ultrasonic measurements down to 20mK. The longitudinal elastic constants of non-doped and B-doped crystalline silicons, which were grown by a floating zone (FZ) method in commercial base, reveal the elastic softening proportional to the reciprocal temperature below 20K. The applied magnetic fields turn the elastic softening of the B-doped FZ silicon to a temperature-independent behavior, while the fields up to 16T do not affect the elastic softening of the non-doped FZ silicon. We present a plausible scenario for this result. Namely the vacancy with the non-magnetic charge state V^0 in the non-doped silicon and the magnetic V^+ in the B-doped silicon is responsible for the low-temperature softening of the shear elastic constants (C_<11>-C_<12>)/2 and C_<44>, which can be described in terms of the quadrupole susceptibility due to the Jahn-Teller effect.
- 社団法人日本物理学会の論文
- 2006-04-15
著者
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Kimura S
Department Of Physics Faculty Of Science Kobe University
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Katano Susumu
Neutron Scattering Group Advanced Science Research Center Japan Atomic Energy Research Institute
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Kakimoto Koichi
Research Institute for Applied Mechanics, Kyushu University
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Kunii S
Graduate School Of Science And Technology Niigata University
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Kunii S
Tohoku Univ. Sendai Jpn
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Sato Ken
Department Of Physics Faculty Of Science Tohoku University
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GOTO Terutaka
Graduate School of Science and Technology,Niigata University
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Goto T
Institute For Materials Research Tohoku University
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NEMOTO Yuichi
Graduate School of Science and Technology, Niigata University
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Goto Tetsuya
Plasma Research Center University Of Tsukuba
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Gotoh Takayuki
Institute For Materials Research Tohoku University
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Goto Takayuki
Department Of Physics Faculty Of Science University Of Tokyo
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NAKAMURA Shintaro
Center for Low Temperature Science,Tohoku University
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Goto T
Nagoya Inst. Technol. Nagoya Jpn
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Goto Takao
Graduate School Of Human And Environmental Studies Kyoto University
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Goto T
Institute For Solid State Physics University Of Tokyo
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Goto T
Univ. Tokyo Chiba
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Goto Tsuneaki
Institute For Solid State Physics University
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Goto Terutaka
Graduate School Of Science And Technology Niigata University
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Saito Yasuhiro
Dep. Of Chemical Sci. And Engineering Graduate School Of Engineering Kobe Univ.
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Nakamura Shintarou
Center For Low-temperature Science Tohoku University
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YAMADA-KANETA Hiroshi
Atsugi Laboratories, Fujitsu Ltd.
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SAITO Yasuhiro
Graduate School of Science and Technology, Niigata University
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SATO Koji
Graduate School of Science and Technology, Niigata University
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Goto T
Institute For Solid State Physics The University Of Tokyo
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Goko T
Institute For Solid State Physics University Of Tokyo
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Kuroiwa S
Department Of Physics Aoyama Gakuin University
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Nemoto Y
Graduate School Of Science And Technology Niigata University
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Kakimoto Koichi
Research Instittue For Applied Mechanics Kyushu University
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Goto Tsuneaki
The Institute Of Solid State Physics Tokyo University
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Nakamura S
Center For Low Temperature Science Tohoku University
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Goto Takao
Graduate School Fo Human And Environmental Studies Kyoto University
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Nemoto Yuichi
Graduate School Of Science And Technology Niigata University
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Nakamura S
Industrial Research Inst. Ishikawa Kanazawa‐shi
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Yamada-kaneta Hiroshi
Atsugi Laboratories Fujitsu Ltd.
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Sato Koji
Graduate School Of Comprehensive Human Sciences University Of Tsukuba
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Nakamura Shintaro
Center for Low Temperature Science, Tohoku University
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Nakamura Shintaro
Center for Low Temperature Science, Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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SATO Koji
Graduate School of Advanced Integration Science, Chiba University
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