SHIRAISHI Kenji | NTT Basic Research Laboratories
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概要
関連著者
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SHIRAISHI Kenji
NTT Basic Research Laboratories
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KAGESHIMA Hiroyuki
NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
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Kageshima Hiroyuki
Ntt Basic Research Laboratories
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Shiraishi K
Institute Of Physics University Of Tsukuba
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KAGESHIMA Hiroyuki
NTT LSI Laboratories
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UEMATSU Masashi
NTT Basic Research Laboratories, NTT Corporation
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Uematsu Masashi
Ntt Basic Research Laboratories
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Shiraishi K
Institute Of Physics Tsukuba University
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Shiraishi K
Japan Atomic Energy Res. Inst. Gunma Jpn
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Ito Tomonori
Ntt System Electroncis Laboratories
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Uematsu M
Ntt Basic Research Laboratories Ntt Corporation
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Takeda Kyozaburo
Department Of Materials Science And Engineering School Of Science And Engineering Waseda University
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Uematsu Masaya
NTT Basic Research Laboratories, NTT Corporation
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Takeda Kyozaburo
Department of Electrical Engineering and Bioscience, Graduate School of Advanced Science and Engineering, Waseda University, Shinjuku, Tokyo 169-8555, Japan
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Shiraishi K
Graduate School Of Pure And Applied Physics University Of Tsukuba
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Nagase Masao
Ntt Basic Research Laboratories
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HORIGUCHI Seishi
Optoelectronics Joint Research Laboratory
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Horiguchi Seiji
Ntt Basic Research Laboratories
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Horiguchi Seiji
Ntt Basic Research Laboratories Ntt Corporation
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Nagase M
Ntt Basic Research Laboratories Ntt Corporation
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Takahashi Y
Ntt Basic Research Laboratories Ntt Cornoration
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Takahashi Y
Osaka University
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TAKAHASHI Yasuo
NTT Basic Research Laboratories, NTT Corporation
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MURASE Katsumi
NTT Basic Research Laboratories, NTT Corporation
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Murase Katsumi
Ntt Basic Research Laboratories Ntt Corporation:(present)ntt Electronics Corporation (nel)
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Ito Tomonori
Ntt System Electronics Laboratories
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Takahashi Yasuo
The Tokyo Metropolitan Research Laboratory Of Public Health:graduate School Of Nutritional And Envir
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Ito Tomonori
Ntt Lsi Laboratories
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Takahashi Yasuo
Faculty Of Pharmaceutical Sciences Tokyo University Of Science
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Takahashi Yasuo
Ntt Basic Research Laboratories Ntt Corporation
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FUKASAKU Katsuhiko
Department of Materials Science and Engineering,School of Science and Engineering,Waseda University
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Fukasaku Katsuhiko
Department Of Materials Science And Engineering School Of Science And Engineering Waseda University
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Horiguchi Seiji
Department of Electrical and Electronic Engineering, Faculty of Engineering and Resource Science, Akita University
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中山 隆史
千葉大学理学部
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TAKAHASHI Yasuo
Graduate School of Information Science and Technology, Hokkaido University
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中山 隆史
千葉大学
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Takahashi Y
Hokkaido Univ. Sapporo‐shi Jpn
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Takeda K
Hitachi Ltd. Hitachi Research Laboratory
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Oyama N
Plasma Research Center University Of Tsukuba
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OHTA Eiji
Keio University
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OHTA Eiji
Department of Material Science, Faculty of Science and Technology, Keio University
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Okamoto Hajime
Department Of Materials Sciences Waseda Universit
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TAKEDA Kyozaburo
Department of Materials Science and Engineering, Waseda University
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KASAHARA Maki
Department of Materials Sciences, Waseda University
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SHIRAISHI Kenji
NTT Research Laboratories
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OKAMOTO Hajime
School of Science and Engineering, Waseda University
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KASAHARA Maki
School of Science and Engineering, Waseda University
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TAKEDA Kyozaburo
School of Science and Engineering, Waseda University
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OHNO Takahisa
NTT LSI Laboratories
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Ito Tomonori
Department Of Physics Engineering Mie University
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Ito Tomonori
Department Of Chemical And Biochemical Engineering Faculty Of Engineering Toyama University
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Kawae Tatsuya
Department Of Applied Quantum Physics Kyushu University
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TAKAYANAGI Hideaki
NTT Basic Research Laboratories, NTT Corporation
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KAWAHARAZUKA Atsushi
Paul Drude Institute
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Takahashi Y
Graduate School Of Information Science And Technology Hokkaido Univ.
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Takeda Kazuyuki
Department Of Energy Conversion Kyushu University
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Horikoshi Yoshiji
School Of Science And Engineering Waseda University
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Kawaharazuka Atsushi
School Of Science And Engineering Waseda University
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Takahashi Y
Department Of Applied Physics School Of Engineering Tohoku University
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TAMURA Hiroyuki
NTT Basic Research Laboratories, NTT Corporation
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OHNO Takahisa
National Institute for Materials Science (NIMS)
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Ohta E
Keio University
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Ohta Eiji
Department Of Agricultural Chemistry Faculty Of Agriculture Kyoto University
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YAMAGUCHI Eiichi
NTT Basic Research Laboratories
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Ohno T
Department Of Quantum Materials Science University Of Tokushima
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Kasahara Maki
Department Of Materials Sciences Waseda University
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Ohno T
National Research Institute For Metals
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Ohno Takahisa
National Institute For Materials Science
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Ohno Takahisa
Computational Materials Science Center National Institute For Materials Science
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Ohno Takahisa
National Research Institute For Metals
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Oyama Norihisa
Department Of Applied Physics And Phisico-infomatics Keio University
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OKAJIMA Ko
Department of Materials Science and Engineering, Waseda University
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Weyers M
Ntt Basic Research Lab. Kanagawa Jpn
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Weyers Markus
Ntt Basic Research Laboratories
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Tamura H
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Okajima Ko
Department Of Materials Science And Engineering Waseda University
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Tamura Hitomi
Network Design Research Center Kyushu Institute Of Technology
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Okamoto Hajime
Department Of Materials Science And Engineering Waseda University
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Murayama M
Univ. Electro‐communications Tokyo Jpn
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Murayama Misao
Department Of Electronics Engineering The University Of Electro-communications
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SUZUKI Yasuo
NTT Basic Research Laboratories
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Ohno Takahisa
First Principles Simulation Group Computational Materials Science Center National Institute For Mate
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Tamura Hideki
Faculty Of Eng. Yamagata Univ.
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Nakayama Takashi
Department Of Biopharmaceutics Graduate School Of Pharmaceutical Sciences Osaka University:crest (co
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TAGUCHI Akihito
NTT Basic Research Laboratories
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Takeda Kyozaburo
Department Of Materials Sciences Waseda Universit
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Takayanagi Hideaki
Ntt Basic Research Laboratories
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Nakayama Takashi
Department Of Biochemistry I Yokohama City University School Of Medicine
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Tamura Hiroyuki
Ntt Basic Research Laboratories
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Shiraishi Kenji
Ntt Basic Research Laboratory
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Ohno Takahisa
Ntt Basic Research Laboratory:(present Address) Ntt Lsi Laboratory
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Ohno Takahisa
Science University Of Tokyo
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Uematsu Masashi
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Shiraishi Kenji
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
著作論文
- First-principles Study on the Stable Molecular Structures of Peptide Nanotubes
- Carbon in III-V Compounds: A Theoretical Approach
- Mechanism of Potential Profile Formation in Silicon Single-Electron Transistors Fabricated Using Pattern-Dependent Oxidation : Semiconductors
- Effect of Oxidation-Induced Strain on Potential Profile in Si SETs Using Pattern-Dependent Oxidation (PADOX)
- Interfacial Silicon Emission in Dry Oxidation -the Effect of H and Cl
- Oxidation Simulation of Heavily Phosphorus-Doped Silicon based on the Interfacial Silicon Emission Model : Semiconductors
- The Effect of Chlorine on Silicon Oxidation : Simulation based on the Interfacial Silicon Emission Model
- Phenomenological Theory on Si Layer-by-Layer Oxidation with Small Interfacial Islands
- Oxidation Simulation of (111) and (100) Silicon Substrates Based on the Interfacial Silicon Emission Model
- Simulation of High-Pressure Oxidation of Silicon Based on the Interfacial Silicon Emission Model
- Unified Simulation of Silicon Oxidation Based on the Interfacial Silicon Emission Model
- Universal Theory of Si Oxidation Rate and Importance of Interfacial Si Emission
- Ferromagnetism in Semiconductor Dot Array
- Phenomenological Theory of Semiconductor Epitaxial Growth with Misfit-Dislocations
- A Theoretical Investigation of the Potential for Infer-Surface Migration of Ga Adatoms between GaAs(001) and (111)B Surfaces
- A Method for Calculating Momentum Matrix Elements with Pseudopotentials
- Universal Theory of Si Oxidation Rate Taking Account of Interfacial Si Emission
- First-Principles Study of the Oxide Growth Process on Silicon Surfaces and at Silicon-Oxide/Silicon Interfaces
- Stable Microstructures on a GaAs(111)A Surface : the Smallest Unit for Epitaxial Growth
- Reflectance Difference Spectra Calculations of GaAs(001) As- and Ga-rich Reconstruction Surface Structures
- Electric Field Induced Recombination Centers in GaAs
- Theoretical Investigation of the Adsorption Behavior of Si Adatoms on GaAs (001)-(2×4) Surfaces
- Electron Counting Monte Carlo Simulation of the Structural Change of the GaAs(001)-c (4×4) Surface during Ga Predeposition
- A Theoretical Inverstigation of Stable Lattice Sites for In Adatoms on GaAs(001)-(2×4) Surface
- Theoretical Investigations of Adsorption Behavior on GaAs(001) Surfaces
- Valence Band Offsets of the In_xGa_As/GaAs Strained-Layer Superlattice
- First Principle Calculation of the DX-Center Ground-States in GaAs,Al_xGa_As Alloys and AlAs/GaAs Superlattices
- Theoretical Studies on Electronic Structures of Polypeptide Chains
- A Theoretical Investigation of Migration Potentials of Ga Adatorms near Step Edges on GaAs(001)-c(4 × 4) Surface
- A New Slab Model Approach for Electronic Structure Calculation of Polar Semiconductor Surface
- First-Principles Study on Electronic Structures of Protein Nanotubes
- Electronic Structures of Protein Nanotubes
- A Theoretical Investigation of Migration Potentials of Ga Adatoms near Kink and Step Edges on GaAs(001)-(2×4) Surface
- The Effect of Chlorine on Silicon Oxidation: Simulation based on the Interfacial Silicon Emission Model