Effect of Nitrogen on Diffusion in Silicon Oxynitride
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-11-30
著者
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KAGESHIMA Hiroyuki
NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
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Shiraishi K
Institute Of Physics University Of Tsukuba
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UEMATSU Masashi
NTT Basic Research Laboratories, NTT Corporation
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SHIRAISHI Kenji
Institute of Physics, University of Tsukuba
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KAGESHIMA Hiroyuki
NTT LSI Laboratories
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