障壁層薄層化によるInP系HEMTの特性改善

概要

論文の詳細を見る
The dependences of source resistance, Rs, transconductance, gm, gate capacitance, Cgs, Cgd, and cutoff frequency, fT, of InP-based HEMTs on an InAlAs barrier layer thickness, d, were investigated. We divided Rs into 4 elements and analyzed the effect of thinning a barrier layer. The resistance originated from the large band discontinuity between InAlAs and InGaAs decreased by thinning a barrier layer, while the resistance in the gate-recessed region increased. As a result, InP-based HEMT with d=10 nm showed lowest Rs. On the other hand, gm increased monotonically with d, due to the reduction of the gate to channel distance, and gmint reached to 2.6 S/mm at d=5 nm. We also estimated fT by using small-signal measurements. fT increased with the reduction of d, which results in the improvement in noise characteristics.
社団法人電気学会の論文
2008-06-01